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Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection. Optics Letters. 37:160-162.. 2012.
Thermally induced interface chemistry in Mo/B4C/Si/B4C multilayered films. Journal of Applied Physics. 112:5.. 2012.
Thermally induced decomposition of B4C barrier layers in Mo/Si multilayer structures. Surface & Coatings Technology. 205:2469-2473.. 2010.
Thermally enhanced interdiffusion in Mo/Si multilayers. Journal of Applied Physics. 103:6.. 2008.
Temperature-dependent nanocrystal formation in Mo/Si multilayers. Physical Review B. 76. 2007.
Surface morphology of Kr+-polished amorphous Si layers. Journal of Vacuum Science & Technology A. 28:552-558.. 2010.
Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors. Applied Optics. 51:8541-8548.. 2012.
Stress Reduction in Multilayers Used for X-Ray and Neutron Optics. Modern Developments in X-Ray and Neutron Optics, Springer Series in Optical Sciences. Vol. 137. 2008.
Sputtering yields of Ru, Mo, and Si under low energy Ar+ bombardment. Journal of Applied Physics. 106:6.. 2009.
Spectral-purity-enhancing layer for multilayer mirrors. Optics Letters. 33:560-562.. 2008.
Spectral properties of La/B - based multilayer mirrors near the boron K absorption edge. Optics Express. 20:11778-11786.. 2012.
Spectral and spatial structure of extreme ultraviolet radiation in laser plasma-wall interactions. Plasma Physics and Controlled Fusion. 54:6.. 2012.
Single-order operation of lamellar multilayer gratings in the soft x-ray spectral range. Aip Advances. 3:012103.. 2013.
Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure. Optics Express. 18:700-712.. 2010.
Si adhesion interlayer effects in hydrogen passivated Si/W soft X-ray multilayer mirrors. Surface Science. 600:1405-1408.. 2006.
Secondary electron yield measurements of carbon covered multilayer optics. Applied Surface Science. 257:354-361.. 2010.
Roughness evolution of Si surfaces upon Ar ion erosion. Applied Surface Science. 256:5011-5014.. 2010.
Reflectivity and surface roughness of multilayer-coated substrate recovery layers for EUV lithographic optics. Optical Engineering. 47:5.. 2008.
Reflective multilayer optics for 6.7 nm wavelength radiation sources and next generation lithography. Thin Solid Films. 518:1365-1368.. 2009.
Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection. Applied Surface Science. 257:6251-6255.. 2011.