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Jinesh KB, van Hemmen JL, van de Sanden MCM, Roozeboom F, Klootwijk JH, Besling WFA, Kessels WMM. 2011. Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films. Journal of the Electrochemical Society. 158:G21-G26. Abstract