<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="6.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">van den Boogaard, A. J. R.</style></author><author><style face="normal" font="default" size="100%">Louis, E.</style></author><author><style face="normal" font="default" size="100%">Zoethout, E.</style></author><author><style face="normal" font="default" size="100%">Goldberg, K. A.</style></author><author><style face="normal" font="default" size="100%">Bijkerk, F.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Characterization of Mo/Si multilayer growth on stepped topographies</style></title><secondary-title><style face="normal" font="default" size="100%">Journal of Vacuum Science &amp; Technology B</style></secondary-title><alt-title><style face="normal" font="default" size="100%">J. Vac. Sci. Technol. B</style></alt-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">OPTICS</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2011</style></year><pub-dates><date><style  face="normal" font="default" size="100%">Sep</style></date></pub-dates></dates><urls><web-urls><url><style face="normal" font="default" size="100%">&lt;Go to ISI&gt;://WOS:000297419000015 </style></url></web-urls></urls><number><style face="normal" font="default" size="100%">5</style></number><volume><style face="normal" font="default" size="100%">29</style></volume><pages><style face="normal" font="default" size="100%">6</style></pages><isbn><style face="normal" font="default" size="100%">1071-1023</style></isbn><language><style face="normal" font="default" size="100%">English</style></language><abstract><style face="normal" font="default" size="100%">Mo/Si multilayer mirrors with nanoscale bilayer thicknesses have been deposited on stepped substrate topographies, using various deposition angles. The multilayer morphology at the step-edge region was studied by cross section transmission electron microscopy. A transition from a continuous- to columnar layer morphology is observed near the step-edge, as a function of the local angle of incidence of the deposition flux. Taking into account the corresponding kinetics and anisotropy in layer growth, a continuum model has been developed to give a detailed description of the height profiles of the individual continuous layers. Complementary optical characterization of the multilayer system using a microscope operating in the extreme ultraviolet wavelength range, revealed that the influence of the step-edge on the planar multilayer structure is restricted to a region within 300 nm from the step-edge. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3628640]</style></abstract><work-type><style face="normal" font="default" size="100%">Article</style></work-type><accession-num><style face="normal" font="default" size="100%">WOS:000297419000015</style></accession-num><notes><style face="normal" font="default" size="100%">ISI Document Delivery No.: 853IITimes Cited: 0Cited Reference Count: 22</style></notes><custom1><style face="normal" font="default" size="100%">nSI</style></custom1><auth-address><style face="normal" font="default" size="100%">[van den Boogaard, A. J. R.; Louis, E.; Zoethout, E.; Bijkerk, F.] FOM Inst Plasma Phys Rijnhuizen, NL-3430 BE Nieuwegein, Netherlands. [Goldberg, K. A.] Univ Calif Berkeley, Lawrence Berkeley Lab, Ctr Xray Opt, Berkeley, CA 94720 USA. [Bijkerk, F.] Univ Twente, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands.van den Boogaard, AJR (reprint author), FOM Inst Plasma Phys Rijnhuizen, POB 1207, NL-3430 BE Nieuwegein, Netherlandsa.j.r.vandenboogaard@rijnhuizen.nl</style></auth-address></record></records></xml>