nSI - Current Projects

Currently executed projects include:
 

• the comprehensive Industrial Partnership Programme named ‘Controlling Photon and Plasma induced Processes at EUV optical surfaces’ (CP3E), supported by FOM, Zeiss, and ASML

• the earlier Zeiss-FOM Industrial Partnership Programme eXtreme UV Multilayer Optics (XMO)

• FOM Programme 75, named PSI-lab: An integrated laboratory on plasma-surface interaction, a fusion research project partly executed within nSI

• Negating HIO-induced metal and carbide EUV surface contamination (No-HIO), a project funded by M2i and ASML

• Stability of EUV caps under reactive environments (SECURE-N), also through M2i and ASML

• the STW funded project Nano-engineering rules for X-ray and EUV optics: Atomic-scale controlled deposition, executed with the University Leiden

• Multilayer Optics for Lithography Beyond the Extreme Ultraviolet Wavelength Range, funded by STW and partner Carl Zeiss SMT AG 

• Materials for photoconversion, in collaboration with TU Delft

• Smart Multilayer Interactive Optics for Lithography at Extreme UV Wavelengths, SMILE

• a feasibility research project on XUV multilayer optics for XFEL, carried out at FLASH, Hamburg, and

• the Nanostructured Arrays project on laterally structured multilayer optics, executed mainly at MESA+