General Seminar 30 January 2003


Fast deposition of microcrystalline silicon solar cells: Choice of deposition process

J.K. Rath

Utrecht University, SID-Physics of Devices
Utrecht, The Netherlands


It is expected that low cost solar cell modules, based on thin film silicon materials, will dominate the PV market. Large area deposition and low material-use are considered to be major advantages. Microcrystalline silicon solar cells in combination with amorphous silicon solar cells in a tandem cell structure (called "micromorph" cell) can deliver high stabilized efficiencies. However, a very fast deposition rate of microcrystalline silicon is required due to thick layers needed for these cells. The process temperature and choice of deposition process for the individual layers of solar cell play a crucial role in determining the deposition rate and configuration of the solar cells. Deposition processes such as hot-wire chemical vapour deposition (HWCVD) and plasma enhanced chemical vapour deposition (PECVD), especially in high frequency range (VHF), and novel deposition techniques such as layer-by-layer (LBL) are explored to achieve this target.