@article{5489,
  author = {E. J. Puik and M. J. van der Wiel and H. Zeijlemaker and J. Verhoeven},
  title = {Ion-Bombardment of X-Ray Multilayer Coatings - Comparison of Ion Etching and Ion Assisted Deposition},
  abstract = {The effects of two forms of ion bombardment treatment on the reflectivity of multilayer X-ray coatings were compared: ion etching of the metal layers, taking place after deposition, and ion bombardment during deposition, the so-called ion assisted deposition. The ion beam was an Ar+ beam of 200 eV, and the multilayer coatings studied were W-C, Ni-C and W-Si. Cu K-alpha reflection measurements (lambda = 0.154 nm) of Ni-C and W-C multilayer coatings having ion etched metal layers showed considerably higher reflectivities than those of coating having as-deposited layers; a factor 2.5 and 4, respectively. Ion etching of tungsten layers in W-Si coatings did not result in enhanced reflectivities. We applied ion assisted deposition to nickel in Ni-C multilayer coatings. We observed enhanced in-situ soft X-ray reflectivities of ion assisted deposited nickel layers with respect to as-deposited layers. However, the observed increases were less than those obtained by ion etching, which we ascribe to bombardment-induced intermixing at the underlying Ni-C interfaces. Finally we demonstrate that during ion assisted deposition and ion etch rates are not additive, but that the ion etch rate increases. The indicates that during deposition a number of atoms are temporarily loosely bound to the surface.},
  year = {1991},
  journal = {Applied Surface Science},
  volume = {47},
  number = {3},
  pages = {251-260},
  month = {Apr},
  isbn = {0169-4332},
  doi = {10.1016/0169-4332(91)90039-m},
  language = {eng},
}