@article{5534,
  author = {F. Bijkerk and E. Louis and E. C. I. Turcu and G. J. Tallents},
  title = {High Repetition Rate Krf Laser Plasma X-Ray Source for Microlithography},
  abstract = {As part of a development programme for a high-intensity laser-plasma X-ray source, experiments have been carried out using a high repetition rate excimer laser (up to 100 Hz; 249 nm, 300 mJ). Remedies are given to problems inherent to operating this type of source at high repetition rates. The combined remedies eliminate the target debris problem. X-ray mask structures down to 0.5-mu-m have been imaged. After implementation of tested upgrades, this source will enable exposures within ten seconds per stepfield.},
  year = {1992},
  journal = {Microelectronic Engineering},
  volume = {17},
  number = {1-4},
  pages = {219-222},
  month = {Mar},
  isbn = {0167-9317},
  doi = {10.1016/0167-9317(92)90045-s},
  language = {eng},
}