@article{5553,
  author = {E. Louis and F. Bijkerk and L. Shmaenok and H. J. Voorma and M. J. van der Wiel and R. Schlatmann and J. Verhoeven and E. W. J. M. van der Drift and J. Romijn and B. A. C. Rousseeuw and F. Voss and R. Desor and B. Nikolaus},
  title = {Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes},
  abstract = {In this paper we present the status of a joint development programme on soft x-ray projection lithography (SXPL) integrating work on high brightness laser plasma sources. fabrication of multilayer x-ray mirrors. and patterning of reflection masks. We are in the process of optimization of a laser-plasma x-ray source and measured the conversion-efficiency of laser light into x-rays. Furthermore we present results of etching patterns in x-ray reflection masks and we discuss improved deposition techniques to produce multilayer coatings with enhanced reflectivity.},
  year = {1993},
  journal = {Microelectronic Engineering},
  volume = {21},
  number = {1-4},
  pages = {67-70},
  month = {Apr},
  isbn = {0167-9317},
  doi = {10.1016/0167-9317(93)90028-4},
  language = {eng},
}