@article{5616,
  author = {E. Louis and H. J. Voorma and N. B. Koster and L. Shmaenok and F. Bijkerk and R. Schlatmann and J. Verhoeven and Y. Y. Platonov and G. E. van Dorssen and H. A. Padmore},
  title = {Enhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment},
  abstract = {In this paper we discuss two techniques to optimize the quality of multilayer x-ray mirrors, namely optimization of the temperature of the substrates during deposition and ion-bombardment of the layers. We produced Mo/Si multilayers applying both methods and present the effect on the near normal incidence reflectivity for lambda=13-14 nm radiation. Furthermore an analysis of the homogeneity of the deposited layers is given.},
  year = {1994},
  journal = {Microelectronic Engineering},
  volume = {23},
  number = {1-4},
  pages = {215-218},
  month = {Jan},
  isbn = {0167-9317},
  doi = {10.1016/0167-9317(94)90140-6},
  language = {eng},
}