@article{5616,
  author = {E. Louis and H. J. Voorma and N. B. Koster and L. Shmaenok and F. Bijkerk and R. Schlatmann and J. Verhoeven and Y . Y. Platonov and G. E. van Dorssen and H. A. Padmore},
  title = {Enhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment},
  abstract = {In this paper we discuss two techniques to optimize the quality of multilayer x-ray mirrors, namely optimization of the temperature of the substrates during deposition and ion-bombardment of the layers. We produced Mo/Si multilayers applying both methods and present the effect on the near normal incidence reflectivity for lambda=13-14 nm radiation. Furthermore an analysis of the homogeneity of the deposited layers is given.},
  year = {1994},
  journal = {Microelectronic Engineering},
  volume = {23},
  number = {1-4},
  pages = {215-218},
  month = {Jan},
  isbn = {0167-9317},
  doi = {10.1016/0167-9317(94)90140-6},
  language = {eng},
}