@article{5631,
  author = {F. Bijkerk and L. Shmaenok and A. Vanhonk and R. Bastiaensen and Y . Y. Platonov and A. P. Shevelko and A. V. Mitrofanov and F. Voss and R. Desor and H. Frowein and B. Nikolaus},
  title = {Laser-Plasma Sources for Soft-X-Ray Projection Lithography},
  abstract = {Results are reported concerning high-repetition-rate excimer lasers with average powers up to 415 W and their usage for generating laser-plasma soft X-ray sources. A conversion efficiency of laser light into monochromatized soft X-ray radiation of 0.7% at 13.5 nm (2% bandwidth) was achieved using an excimer laser of which the beam quality was adapted for this application. Two methods to mitigate the production of plasma debris have been analyzed: tape targets and the use of Kr as a buffer gas. The optimum coating thickness of tape targets coated with Ta has determined to be 1 mum. Ta tape targets and the Kr buffer were used in a debris contamination test of 10(5) pulses. After this exposure, the reflectivity of a normal incidence Mo-Si multilayer mirror that faced the plasma, was found to be 18% lower. The contamination could be removed by cleaning, which restored the reflectivity to 97% of the initial value.},
  year = {1994},
  journal = {Journal De Physique Iii},
  volume = {4},
  number = {9},
  pages = {1669-1677},
  month = {Sep},
  isbn = {1155-4320},
  doi = {10.1051/jp3:1994232},
  language = {eng},
}