@article{5950,
  author = {G. J. Nienhuis and W. Goedheer},
  title = {Modelling of a large scale reactor for plasma deposition of silicon},
  abstract = {A 2D fluid model for RF discharges in a mixture of silane and hydrogen is applied to a cylindrically symmetric reactor with an electrode radius large compared to the electrode separation. In the model the electron kinetics are included by solving the two-term Boltzmann equation to obtain the electron energy distribution function. The chemistry is taken from the literature and only diffusive transport of the neutral species is considered. The plasma-wall interaction (including the deposition) is modelled by using surface reaction coefficients. As a result of the large depletion of silane, the uniformity of the deposition strongly depends on the type of gas inlet. Both a showerhead gas inlet system, where the powered electrode is perforated, and gas inlet through a ring shaped area around one of the electrodes are considered. As can be expected, both the discharge and the deposition are homogeneous in case of a shower inlet. The ring inlet leads to an almost pure hydrogen plasma in the centre, while at the edge of the electrodes a mixture of silane and hydrogen is present. As compared to a small scale reactor with a low depletion, the growth precursor shifts from SiH3 and higher silane radicals to SiH2.},
  year = {1999},
  journal = {Plasma Sources Science & Technology},
  volume = {8},
  number = {2},
  pages = {295-298},
  month = {May},
  isbn = {0963-0252},
  doi = {10.1088/0963-0252/8/2/310},
  language = {eng},
}