@article{5954,
  author = {R. Stuik and E. Louis and A. E. Yakshin and P. C. Gorts and E. L. G. Maas and F. Bijkerk and D. Schmitz and F. Scholze and G. Ulm and M. Haidl},
  title = {Peak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography},
  abstract = {Reported is the optimization of the fabrication of Mo/Si multilayer systems produced by e-beam evaporation and ion-beam smoothening. The impact of a number of coating parameters is verified such as variation of the mirror's center wavelength and the metal fraction of the bilayer (Gamma ratio), resulting in reflectivities up to 68.6% at normal incidence. Parallel to this experimental work, a numerical optimization based on experimentally determined multilayer properties is carried out on the throughput of multimirror lithographic systems for the 11-15 nm wavelength region using Mo/Si and Mo/Be coatings. The center wavelength, Gamma ratio and layer stack have been optimized. The calculations show an optimum throughput for a 10-mirror Mo/Si system at 14.4 nm, assuming a light source with a wavelength independent spectrum. (C) 1999 American Vacuum Society. [S0734-211X(99)12106-1].},
  year = {1999},
  journal = {Journal of Vacuum Science & Technology B},
  volume = {17},
  number = {6},
  pages = {2998-3002},
  month = {Nov-Dec},
  isbn = {1071-1023},
  doi = {10.1116/1.590942},
  language = {eng},
}