@article{6127,
  author = {F. Bijkerk},
  title = {Development of multilayer coatings and spin-off to XRL applications},
  abstract = {The substantially increased effort on multilayer coating technology, as motivated currently by the application of Mo/Si coatings in Extreme UV lithography, is expected to have a beneficial effect on the technology for multilayer optics in the XUV wavelength range in general. Some examples of new usage of multilayer structures in XRL research are given.},
  year = {2001},
  journal = {Journal De Physique Iv},
  volume = {11},
  number = {PR2},
  pages = {509-510},
  month = {Jul},
  isbn = {1155-4339},
  doi = {10.1051/jp4:2001298},
  language = {eng},
}