@article{6717,
  author = {A. Gordijn and M. Vanecek and W. J. Goedheer and J.K. Rath and R. E. I. Schropp},
  title = {Influence of pressure and plasma potential on high growth rate microcrystalline silicon grown by very high frequency plasma enhanced chemical vapour deposition},
  year = {2006},
  journal = {Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers},
  volume = {45},
  number = {8A},
  pages = {6166-6172},
  month = {Aug},
  isbn = {0021-4922},
  url = {<Go to ISI>://000240512800022},
  note = {Gordijn, A. Vanecek, M. Goedheer, W. J. Rath, J. K. Schropp, R. E. I.},
  language = {eng},
}