@article{6766,
  author = {L. Alink and R. W.E. van de Kruijs and E. Louis and F. Bijkerk and J. Verhoeven},
  title = {Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions},
  year = {2006},
  journal = {Thin Solid Films},
  volume = {510},
  number = {1-2},
  pages = {26-31},
  month = {07/2006},
  isbn = {0040-6090},
  url = {<Go to ISI>://000238011200005},
  language = {eng},
}