@article{7002,
  author = {Mmjw van Herpen and Rwev de Kruijs and D. J. W. Klunder and E. Louis and A. E. Yakshin and S. Alonso van der Westen and F. Bijkerk and V. Banine},
  title = {Spectral-purity-enhancing layer for multilayer mirrors},
  abstract = {We demonstrate, both theoretically and experimentally, that special spectral-purity-enhancing multilayer mirror systems can be designed and fabricated to substantially reduce the level of out-of-band radiation expected in an extreme ultraviolet lithographic tool. A first proof of principle of applying such spectral-purity-enhancement layers showed reduced out-of-band reflectance by a factor of five, while the in-band reflectance is only 4.5% (absolute) less than for a standard capped multilayer. (C) 2008 Optical Society of America.},
  year = {2008},
  journal = {Optics Letters},
  volume = {33},
  number = {6},
  pages = {560-562},
  month = {Mar},
  isbn = {0146-9592},
  url = {<Go to ISI>://000254907500010 },
  note = {ISI Document Delivery No.: 287HITimes Cited: 0Cited Reference Count: 15},
  language = {English},
}