@article{7104,
  author = {S. M. Wu and R. van de Kruijs and E. Zoethout and F. Bijkerk},
  title = {Sputtering yields of Ru, Mo, and Si under low energy Ar+ bombardment},
  abstract = {Ion sputtering yields for Ru, Mo, and Si under Ar+ ion bombardment in the near-threshold energy range have been studied using an in situ weight-loss method with a Kaufman ion source, Faraday cup, and quartz crystal microbalance. The results are compared to theoretical models. The accuracy of the in situ weight-loss method was verified by thickness-decrease measurements using grazing incidence x-ray reflectometry, and results from both methods are in good agreement. These results provide accurate data sets for theoretical modeling in the near-threshold sputter regime and are of relevance for (optical) surfaces exposed to plasmas, as, for instance, in extreme ultraviolet photolithography.},
  year = {2009},
  journal = {Journal of Applied Physics},
  volume = {106},
  number = {5},
  pages = {6},
  month = {Sep},
  isbn = {0021-8979},
  url = {<Go to ISI>://000269850300134 },
  note = {ISI Document Delivery No.: 494WNTimes Cited: 0Cited Reference Count: 21},
  language = {English},
}