@article{7331,
  author = {S. Bruijn and R. W. E. van de Kruijs and A. E. Yakshin and F. Bijkerk},
  title = {In-situ study of the diffusion-reaction mechanism in Mo/Si multilayered films},
  abstract = {We present a low temperature diffusion study on the formation of intermixing zones between periodic, nanometer thick films consisting of Mo and Si. An in-situ X-ray diffraction method at pm-accuracy was developed, including a model that explains the period change observed by diffusion limited interface growth. Experiments were carried out on Mo/Si multilayered films in the temperature range of 100-275 degrees C, resulting in the determination of diffusion coefficients. Temperature scaling showed Arrhenius-type behavior of the diffusion constant over the entire temperature range, with an activation energy of 0.5 eV. (C) 2010 Elsevier B.V. All rights reserved.},
  year = {2011},
  journal = {Applied Surface Science},
  volume = {257},
  pages = {2707-2711},
  month = {Jan},
  isbn = {0169-4332},
  doi = {0.1016/j.apsusc.2010.10.049},
  language = {English},
}