@article{7348,
  author = {H. B. Profijt and P. Kudlacek and M. C. M. van de Sanden and W. M. M. Kessels},
  title = {Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides},
  abstract = {The influence of ions and photons during remote plasma atomic layer deposition (ALD) of metal oxide thin films was investigated for different O-2 gas pressures and plasma powers. The ions have kinetic energies of },
  year = {2011},
  journal = {Journal of the Electrochemical Society},
  volume = {158},
  pages = {G88-G91},
  isbn = {0013-4651},
  doi = {10.1149/1.3552663},
  language = {English},
}