@article{7428,
  author = {A. J. R. van den Boogaard and E. Louis and E. Zoethout and K. A. Goldberg and F. Bijkerk},
  title = {Characterization of Mo/Si multilayer growth on stepped topographies},
  abstract = {Mo/Si multilayer mirrors with nanoscale bilayer thicknesses have been deposited on stepped substrate topographies, using various deposition angles. The multilayer morphology at the step-edge region was studied by cross section transmission electron microscopy. A transition from a continuous- to columnar layer morphology is observed near the step-edge, as a function of the local angle of incidence of the deposition flux. Taking into account the corresponding kinetics and anisotropy in layer growth, a continuum model has been developed to give a detailed description of the height profiles of the individual continuous layers. Complementary optical characterization of the multilayer system using a microscope operating in the extreme ultraviolet wavelength range, revealed that the influence of the step-edge on the planar multilayer structure is restricted to a region within 300 nm from the step-edge. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3628640]},
  year = {2011},
  journal = {Journal of Vacuum Science & Technology B},
  volume = {29},
  pages = {6},
  month = {Sep},
  isbn = {1071-1023},
  url = {http://escholarship.org/uc/item/7816k3pj.pdf%E2%80%8E},
  doi = {10.1116/1.3628640  },
  language = {English},
}