@article{7491,
  author = {K. Sharma and A. Branca and A. Illiberi and F. D. Tichelaar and M. Creatore and M. C. M. van de Sanden},
  title = {On the Effect of the Amorphous Silicon Microstructure on the Grain Size of Solid Phase Crystallized Polycrystalline Silicon},
  abstract = {In this paper the effect of the microstructure of remote plasma-deposited amorphous silicon films on the grain size development in polycrystalline silicon upon solid-phase crystallization is reported. The hydrogenated amorphous silicon films are deposited at different microstructure parameter values R* (which represents the distribution of SiHx bonds in amorphous silicon), at constant hydrogen content. Amorphous silicon films undergo a phase transformation during solid-phase crystallization and the process results in fully (poly-)crystallized films. An increase in amorphous film structural disorder (i.e., an increase in R*), leads to the development of larger grain sizes (in the range of 700-1100 nm). When the microstructure parameter is reduced, the grain size ranges between 100 and 450 nm. These results point to the microstructure parameter having a key role in controlling the grain size of the polycrystalline silicon films and thus the performance of polycrystalline silicon solar cells.},
  year = {2011},
  journal = {Advanced Energy Materials},
  volume = {1},
  pages = {401-406},
  month = {May},
  isbn = {1614-6832},
  doi = {10.1002/aenm.201000074},
  language = {English},
}