@article{7501,
  author = {I. Makhotkin and E. Zoethout and E. Louis and A. M. Yakunin and S. Muellender and F. Bijkerk},
  title = {Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet},
  abstract = {The spectral properties of LaN/B and LaN∕B4C multilayer mirrors have been investigated in the 6.5 to 6.9 nm wavelength range, based on measured B and B4C optical constants. We show that the wavelength of optimal reflectance for boron-based optics is between 6.63 and 6.65 nm, depending on the boron chemical state. The wavelength of the maximum reflectance of the LaN∕B4C multilayer system is confirmed experimentally. Calculations of the wavelength-integrated reflectance for perfect ten-multilayer-mirror stacks show that a B-based optical column can be optimized for a wavelength larger than 6.65 nm.
},
  year = {2012},
  journal = {Journal of Micro/Nanolithography, MEMS and MOEMS},
  volume = {11},
  chapter = {040501-1},
  number = {4},
  pages = {040501},
  month = {19-Oct-12},
  publisher = {SPIE},
  doi = {10.1117/1.JMM.11.4.040501},
  language = {eng},
}