@article{7537,
  author = {J. Bosgra and E. Zoethout and A. M. J. van der Eerden and J. Verhoeven and R. W. E. van de Kruijs and A. E. Yakshin and F. Bijkerk},
  title = {Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors},
  abstract = {We studied the structure and optical properties of B 4 C/Mo/Y/Si  multilayer systems. Using extended x-ray absorption fine structure measurements at the Y and Mo K-edge, the structure of the subnanometer thick Y layer and the underlying Mo layer were analyzed. It was found that even a 0.2 nm thick Y layer significantly reduced silicon diffusion toward Mo, thus reducing Mo silicide formation. Hard x-ray reflectometry showed that the difference in average interface roughness of the B 4 C/Mo/Y/Si  multilayer structure compared to Mo/Si and B 4 C/Mo/B 4 C/Si  multilayer structures was negligible. Soft x-ray reflectometry showed optical improvement of B 4 C/Mo/Y/Si  with respect to Mo/Si and B 4 C/Mo/B 4 C/Si  multilayer structures.},
  year = {2012},
  journal = {Applied Optics},
  volume = {51},
  number = {36},
  pages = {8541-8548},
  month = {2012/12/13},
  publisher = {OSA},
  url = {http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-36-8541 },
  doi = {10.1364/AO.51.008541},
  language = {eng},
}