@article{7682,
  author = {A. J. R. van den Boogaard and F. A. van Goor and E. Louis and F. Bijkerk},
  title = {Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection},
  abstract = {A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, lambda = 13.5 nm) reflectance values up to 64% are demonstrated, while the diffractive properties can be exploited in spectral filtering applications. The results can contribute to a wavelength-unspecific solution for the suppression of lambda > 100 nm out-of-band radiation in EUV lithography. (C) 2012 Optical Society of America},
  year = {2012},
  journal = {Optics Letters},
  volume = {37},
  number = {2},
  pages = {160-162},
  month = {Jan},
  isbn = {0146-9592},
  url = {http://www.opticsinfobase.org/ol/abstract.cfm?uri=ol-37-2-160},
  doi = {10.1364/OL.37.000160},
  language = {English},
}