@article{8027,
  author = {D. Alegre and T. Acsente and A. B. Martin-Rojo and E. Oyarzabal and F. L. Tabares and G. Dinescu and G. De Temmerman and R. Birjega and C. Logofatu and J. Kovac and M. Mozetic},
  title = {Characterisation of Tungsten Nitride Layers and their Erosion under Plasma Exposure in NANO-PSI},
  abstract = {The properties of tungsten nitride thin films deposited by both reactive RF-magnetron sputtering from tungsten targets in Argon/N-2, and RF generated nitrogen ions bombardment of previously sequentially deposited tungsten layers have been investigated. Films exhibited smaller erosion than pure tungsten in Argon plasmas at NANO-PSI expanding thermal plasma device.},
  year = {2015},
  journal = {Romanian Reports in Physics},
  volume = {67},
  pages = {532-546},
  month = {2015},
  isbn = {1221-1451},
  url = {http://www.rrp.infim.ro/2015_67_2/A23.pdf},
  language = {eng},
}