@article{8088,
  author = {S. A. Starostin and W. Keuning and J. Schalken and M. Creatore and W. M. M. Kessels and J. B. Bouwstra and M. C. M. van de Sanden and H. W. de Vries},
  title = {Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers},
  abstract = {The synergy between fast (1600 nm · min−1), roll-to-roll plasma-enhanced chemical vapor deposited (PE-CVD) SiO2 layers and plasma-assisted atomic layer deposited (PA-ALD) ultra-thin Al2O3 films has been investigated in terms of moisture permeation barrier properties. The effective and intrinsic water vapor transmission rates (WVTR) were studied as a function of the number of ALD cycles. It was demonstrated that a synergistic combination of a silica buffer layer deposited on polymer with an ultra-thin (≤ 2 nm) alumina barrier film can provide excellent intrinsic (10−5–10−6 g · m−2 · day−1) and good effective (∼10−3 g · m−2 · day−1) WVTR values, whereas both single layers individually exhibit poor barrier performances with effective WVTR values of ≥ 1.0 g · m−2 · day−1.
},
  year = {2016},
  journal = {Plasma Processes and Polymers},
  volume = {13},
  pages = {311-315},
  doi = {10.1002/ppap.201500096},
  language = {eng},
}