@article{8161,
  author = {Y. Z. Jia and W. Liu and B. Xu and G. N. Luo and S. L. Qu and T. W. Morgan and G. De Temmerman},
  title = {Mechanism for orientation dependence of blisters on W surface exposed to D plasma at low temperature},
  abstract = {The orientation dependence of blister formation induced by D plasma exposure at low temperature (about 523 K) on rolled tungsten and chemical vapor deposition (CVD) W samples was studied by scanning electron microscopy and electron backscatter diffraction. Severe blistering was observed on grains with surface normal directions close to [111], while the [001] surfaces are the most resistant to blister formation. Cavities induced by D2 gas were observed beneath [111], [110] and [001] surfaces, independently on whether blisters were observed on the surface or not. The [111] surface is more prone to blister formation, because it is easily plastically deformed by the D2 gas pressure. Some blister edges and steps were perpendicular to [110] directions, which may be induced by the slipping of dislocations on {110} planes. The blister morphology induced by D plasma can be well explained by the blister model based on plastic deformation mechanism.},
  year = {2016},
  journal = {Journal of Nuclear Materials},
  volume = {477},
  pages = {165-171},
  doi = {10.1016/j.jnucmat.2016.05.011},
  language = {eng},
}