@phdthesis{8320,
  author = {A. S. Meshkova},
  title = {Atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) of silica: Understanding the role of the local deposition rate in the surface and film morphology},
  year = {2018},
  volume = {PhD},
  month = {2018/12/04},
  publisher = {Eindhoven University of Technology},
  address = {Eindhoven, Netherlands},
  isbn = {9789038646527},
  url = {https://research.tue.nl/en/publications/atmospheric-pressure-plasma-enhanced-chemical-vapour-deposition-o-2},
  language = {eng},
}