@article{8869,
  author = {J.H. Slief and R. J.R. van Kampen and M.W. Brookman and M. van Berkel},
  title = {Extension of the flux fit method for estimating power deposition profiles},
  abstract = {The flux fit method is used to self-consistently estimate the power deposition profile and heat transport profiles from temperature measurements originating from perturbative experiments with a modulated source. This Letter improves on this method by addressing the limitations and assumptions. The most crucial improvement is the additional freedom in the source deposition profile. Allowing for a variable central deposition location and height and including a skewness parameter produces deposition profiles more consistent with the measurement data, but still wider than equilibrium ray tracing in two different DIII-D discharges. Moreover, we show that the quality of the estimated deposition profile is key to the accuracy of diffusivity and convectivity estimates, but inversely, the estimated transport parameters hardly affect the quality of the power deposition estimate. Using this method, we show that the power deposition profile estimate is broadened with respect to ray-tracing by about 1.7–1.8 times in two DIII-D discharges.
},
  year = {2022},
  journal = {Physics of Plasmas},
  volume = {29},
  pages = {010703},
  doi = {10.1063/5.0069869},
  language = {eng},
}