@article{8909,
  author = {S. Kajita and T. Eda and S. Feng and H. Tanaka and A. Bieberle-Hütter and N. Ohno},
  title = {Increased photoelectrochemical performance of vanadium oxide thin film by helium plasma treatment with auxiliary molybdenum deposition},
  abstract = {Helium (He) plasma treatment can be a versatile tool to fabricate nanostructures on a surface and change the surface chemistry. Herein, vanadium (V) thin film is exposed to helium plasmas and the changes in morphology and surface properties are investigated. The irradiation condition at which the surface morphology can be changed is identified. During the He plasma irradiation, molybdenum (Mo) from the sample cover deposits and formation of composite nanostructured photoelectrode with a combination of V2 O5/Mo O3 occurs. The photoelectrochemical (PEC) performance increases threefold through the plasma treatment. In addition to the increase in the surface area, the formation of the heterogenous/composite structure, oxygen vacancies, and reduced oxides such as V6 O13 decreases the charge-transfer resistance and contributes to the improvement in the PEC performance.},
  year = {2023},
  journal = {Advanced Energy and Sustainability Research},
  volume = {4},
  pages = {2200141},
  doi = {10.1002/aesr.202200141},
  language = {eng},
}