Characterization of Mo/Si multilayer growth on stepped topographies

TitleCharacterization of Mo/Si multilayer growth on stepped topographies
Publication TypeJournal Article
Year of Publication2011
Authorsvan den Boogaard AJR, Louis E, Zoethout E, Goldberg KA, Bijkerk F
Secondary TitleJournal of Vacuum Science & Technology B
Date PublishedSep
Type of ArticleArticle
ISBN Number1071-1023
AbstractMo/Si multilayer mirrors with nanoscale bilayer thicknesses have been deposited on stepped substrate topographies, using various deposition angles. The multilayer morphology at the step-edge region was studied by cross section transmission electron microscopy. A transition from a continuous- to columnar layer morphology is observed near the step-edge, as a function of the local angle of incidence of the deposition flux. Taking into account the corresponding kinetics and anisotropy in layer growth, a continuum model has been developed to give a detailed description of the height profiles of the individual continuous layers. Complementary optical characterization of the multilayer system using a microscope operating in the extreme ultraviolet wavelength range, revealed that the influence of the step-edge on the planar multilayer structure is restricted to a region within 300 nm from the step-edge. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3628640]
Alternate JournalJ. Vac. Sci. Technol. B