| Title | Characterization of Mo/Si multilayer growth on stepped topographies |
| Publication Type | Journal Article |
| Year of Publication | 2011 |
| Authors | van den Boogaard AJR, Louis E, Zoethout E, Goldberg KA, Bijkerk F |
| Journal | Journal of Vacuum Science & Technology B |
| Volume | 29 |
| Pagination | 6 |
| Date Published | Sep |
| Type of Article | Article |
| ISBN Number | 1071-1023 |
| Accession Number | WOS:000297419000015 |
| Keywords | OPTICS |
| Abstract | Mo/Si multilayer mirrors with nanoscale bilayer thicknesses have been deposited on stepped substrate topographies, using various deposition angles. The multilayer morphology at the step-edge region was studied by cross section transmission electron microscopy. A transition from a continuous- to columnar layer morphology is observed near the step-edge, as a function of the local angle of incidence of the deposition flux. Taking into account the corresponding kinetics and anisotropy in layer growth, a continuum model has been developed to give a detailed description of the height profiles of the individual continuous layers. Complementary optical characterization of the multilayer system using a microscope operating in the extreme ultraviolet wavelength range, revealed that the influence of the step-edge on the planar multilayer structure is restricted to a region within 300 nm from the step-edge. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3628640] |
| URL | http://gateway.isiknowledge.com/gateway/Gateway.cgi?&GWVersion=2&SrcAuth=Test&SrcApp=TestApp&DestLinkType=FullRecord&KeyUT=WOS:000297419000015&DestApp=WOS |
| Department | nSI |
| Alternate Journal | J. Vac. Sci. Technol. B |
