Modification by Ar and Kr Ion-Bombardment of Mo/Si X-Ray Multilayers

TitleModification by Ar and Kr Ion-Bombardment of Mo/Si X-Ray Multilayers
Publication TypeJournal Article
Year of Publication1994
AuthorsR. Schlatmann, C. Lu, J. Verhoeven, E.J Puik, M.J van der Wiel
JournalApplied Surface Science
Volume78
Number2
Pagination147-157
Date PublishedJun
ISBN Number0169-4332
Abstract

We have investigated the details of the growth of electron-beam deposited molybdenum and silicon layers and the effect of ion-beam bombardment on the morphology and interface smoothness of those layers. Using in-situ X-ray reflectivity, theta-2theta reflectivity scans, Auger Electron Spectroscopy (AES) and Transmission Electron Microscopy (TEM) we find that a reduction in both Mo and Si surface roughness can occur as a result of the ion-beam bombardment. However, the overall smoothing effect is limited by interface mixing at the underlying interface and it is also dependent on the deposition morphology for Mo layers. When depositing multilayers with 10 periods of 6 nm we find a large (factor 4) improvement of the reflectivity as a result of the ion-beam bombardment. Our best results, obtained by polishing all Si layers after growth with 300 eV Kr+ ions, give a roughness of 0.3 nm for the Mo-on-Si interfaces and less than 0.5 nm for Si-on-Mo interfaces. Cross-section TEM pictures confirm the observations qualitatively.

DOI10.1016/0169-4332(94)00108-1
PID

f48105a810680631135d57a33a023683

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