Atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) of silica: Understanding the role of the local deposition rate in the surface and film morphology

TitleAtmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) of silica: Understanding the role of the local deposition rate in the surface and film morphology
Publication TypeThesis
Year of Publication2018
AuthorsA.S Meshkova
DegreePhD
Date Published2018/12/04
UniversityEindhoven University of Technology
CityEindhoven, Netherlands
Thesis TypePhD
ISBN Number9789038646527
URLhttps://research.tue.nl/en/publications/atmospheric-pressure-plasma-enhanced-chemical-vapour-deposition-o-2
Division

MaSF

Department

APPFF

PID

ac3638a55ac9690a0860f25bf73c8dcd

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