|Title||Particle-in-cell/Monte Carlo simulation of radio frequency SiH4/H-2 discharges|
|Publication Type||Journal Article|
|Year of Publication||1999|
|Authors||M. Yan, W.J Goedheer|
|Journal||Ieee Transactions on Plasma Science|
In this paper we report on a study of SiH4/H-2 radio-frequency discharges using the particle-in-cell/Monte Carlo (PIC/MC) method. A special procedure based on the rate balance for negative ions has been developed to speed up the simulation for this kind of electronegative discharge. The electron energy distribution function and the angular and energy distribution function of ions arriving at the substrate have been studied at different discharge settings (frequency, pressure, voltage, and power). The simulations show that the electrons are heated ohmically, so the average electron energy can be increased only by increasing the voltage, A high radical density, a high and more directional ion flux, and a low average ion energy can be obtained by a combination of a high frequency and a low RF voltage. The behavior of the dissociation rate with the discharge parameters is consistent with the experimentally observed consumption of SiH4. The simulated ion energy distribution functions are in good agreement with experimental results.
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