Publications

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A
F. Bijkerk, E. Louis, G.E van Dorssen, A.P Shevelko, A.A VasilyevAbsolute Brightness of Laser Plasmas in the Soft-X-Ray Emission Band, Applied Optics 133 (1994) 82-88.
R. Stuik, F. Scholze, J. Tummler, F. BijkerkAbsolute calibration of a multilayer-based XUV diagnostic, Nuclear Instruments & Methods in Physics Research Section a-Accelerators Spectrometers Detectors and Associated Equipment 1-2492 (2002) 305-316.
R. de Bruijn, K. Koshelev, G. Kooijman, E.S Toma, F. BijkerkAbsorption of EUV in laser plasmas generated on xenon gas jets, Journal of Quantitative Spectroscopy & Radiative Transfer 1-481 (2003) 97-105.
M. Bayraktar, W. Wessels, C.J Lee, F. Van Goor, G. Koster, G. Rijnders, F. BijkerkActive multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths, J. Phys. D: Appl. Phys. 4945 (2012) 494001.
OA 
I.V Kozhevnikov, R. van der Meer, H.MJ Bastiaens, K.J Boller, F. BijkerkAnalytic theory of soft x-ray diffraction by lamellar multilayer gratings, Opt. Express 1019 (2011) 9172-9184.
OA 
A. Rouzee, P. Johnsson, E.V Gryzlova, H. Fukuzawa, A. Yamada, W. Siu, Y. Huismans, E. Louis, F. Bijkerk, D.MP Holland et al.Angle-resolved photoelectron spectroscopy of sequential three-photon triple ionization of neon at 90.5 eV photon energy, Phys. Rev. A 83 (2011) 031401.
H.J Voorma, E. Louis, F. Bijkerk, S. AbdaliAngular and energy dependence of ion bombardment of Mo/Si multilayers, Journal of Applied Physics 482 (1997) 1876-1881.
V.V Medvedev, J. Yang, A.J Schmidt, A.E Yakshin, R.WE van de Kruijs, E. Zoethout, F. BijkerkAnisotropy of heat conduction in Mo/Si multilayers, J. Appl. Phys. 118 (2015) 085101.
T. Tsarfati, E. Zoethout, R.WE van de Kruijs, F. BijkerkAtomic O and H exposure of C-covered and oxidized d-metal surfaces, Surf. Sci. 16603 (2009) 2594-2599.
C
J.Q Chen, E. Louis, H. Wormeester, R. Harmsen, R. van de Kruijs, C.J Lee, W. van Schaik, F. BijkerkCarbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry, Meas. Sci. Technol. 22 (2011) 105705.
A. Dolgov, D. Lopaev, C.J Lee, E. Zoethout, V. Medvedev, O. Yakushev, F. BijkerkCharacterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source, Appl. Surf. Sci. 353 (2015) 708-713.
J.Q Chen, C.J Lee, E. Louis, F. Bijkerk, R. Kunze, H. Schmidt, D. Schneider, R. MoorsCharacterization of EUV induced carbon films using laser-generated surface acoustic waves,  (2009) 768-771.
A.JR van den Boogaard, E. Louis, E. Zoethout, K.A Goldberg, F. BijkerkCharacterization of Mo/Si multilayer growth on stepped topographies, J. Vac. Sci. Technol. B 29 (2011) 6.
OA 
H.J Voorma, E. Louis, N.B Koster, F. Bijkerk, E. SpillerCharacterization of multilayers by Fourier analysis of x-ray reflectivity, Journal of Applied Physics 981 (1997) 6112-6119.
V de Rooij-Lohmann, L.W Veldhuizen, E. Zoethout, A.E Yakshin, R.WE van de Kruijs, B.J Thijsse, M. Gorgoi, F. Schafers, F. BijkerkChemical interaction of B4C, B, and C with Mo/Si layered structures, J. Appl. Phys. 9108 (2010) 6.
T. Tsarfati, E. Zoethout, R. van de Kruijs, F. BijkerkChemically mediated diffusion of d-metals and B through Si and agglomeration at Si-on-Mo interfaces, J. Appl. Phys. 10105 (2009) 5.
M.L Grecea, M.A Gleeson, W. van Schaik, A.W Kleyn, F. BijkerkCo-adsorption of NH(3) and SO(2) on quartz(0001): Formation of a stabilized complex, Chem. Phys. Lett. 4-6511 (2011) 270-276.
S.N Yakunin, I.A Makhotkin, K.V Nikolaev, R.WE van de Kruijs, M.A Chuev, F. BijkerkCombined EUV reflectance and X-ray reflectivity data analysis of periodic multilayer structures, Opt. Express 22 (2014) 20076–20086.
OA 
A. Dolgov, D. Lopaev, T. Rachimova, A. Kovalev, A. Vasil'Eva, C.J Lee, V.M Krivtsun, O. Yakushev, F. BijkerkComparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas, J. Phys. D-Appl. Phys. 47 (2014) 065205.
OA 

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