Publications
The application of energetic CHx+ ions to form a Si/SiC multilayer system for reflection of radiation between 20 and 80 nm, Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms 3-4237 (2005) 533-542.
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Characterization of the Resolving Power of a Double Multilayer Monochromator in the Energy-Range of 600-900 Ev, Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films 69 (1991) 3142-3148.
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Determination of in-depth density profiles of multilayer structures, Journal of Applied Physics 997 (2005)
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Enhanced Reflectivity of Soft-X-Ray Multilayer Mirrors by Reduction of Si Atomic Density, Applied Physics Letters 2463 (1993) 3297-3299.
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Enhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment, Microelectronic Engineering 1-423 (1994) 215-218.
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Formation of Si/SiC multilayers by low-energy ion implantation and thermal annealing, Nucl. Instrum. Methods Phys. Res. Sect. B-Beam Interact. Mater. Atoms 6268 (2010) 560-567.
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Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions, Thin Solid Films 1-2510 (2006) 26-31.
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Ion beam induced intermixing of interface structures in W/Si multilayers, Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms 3-4222 (2004) 484-490.
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Ion Etching of Thin W-Layers - Enhanced Reflectivity of W-C Multilayer Coatings, Applied Surface Science 147 (1991) 63-76.
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Ion-Bombardment of Thin-Layers - the Effect on the Interface Roughness and Its X-Ray Reflectivity, Review of Scientific Instruments 163 (1992) 1415-1419.
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Ion-Bombardment of X-Ray Multilayer Coatings - Comparison of Ion Etching and Ion Assisted Deposition, Applied Surface Science 347 (1991) 251-260.
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Ion-induced interface layer formation in W/Si and WRe/Si multilayers, Surface Science 1-3582 (2005) 227-234.
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Modification by Ar and Kr Ion-Bombardment of Mo/Si X-Ray Multilayers, Applied Surface Science 278 (1994) 147-157.
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Non-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth, Thin Solid Films 522 (2012) 228–232.
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Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection, Appl. Surf. Sci. 257 (2011) 6251-6255.
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Reflection Extended X-Ray Absorption Fine-Structure Measurements on Ni/C and Nixsiy/C Multilayered Reflection Coatings, Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films 46 (1988) 2182-2187.
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The Role of Layer Growth on Interface Roughness in Ni-C Multilayer X-Ray Mirrors, Vacuum 8-1038 (1988) 707-709.
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Secondary electron yield measurements of carbon covered multilayer optics, Appl. Surf. Sci. 2257 (2010) 354-361.
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Si adhesion interlayer effects in hydrogen passivated Si/W soft X-ray multilayer mirrors, Surface Science 6600 (2006) 1405-1408.
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