Publications

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2014
S.N Yakunin, I.A Makhotkin, R.WE van de Kruijs, M.A Chuev, E.M. Pashaev, E. Zoethout, E. Louis, Y S. Seregin, I.A. Subbotin, D.V Novikov et al.,  Model independent X-ray standing wave analysis of periodic multilayer structures, J. Appl. Phys. 115 (2014) 134303.
Q. Huang, M. de Boer, J. Barreaux, R. van der Meer, E. Louis, F. Bijkerk,  High efficiency structured EUV multilayer mirror for spectral filtering of long wavelengths, Opt. Express 22 (2014) 19365-19374.
OA 
2013
E. Zoethout, E. Louis, F. Bijkerk,  Real-space insight in the nanometer scale roughness development during growth and ion beam polishing of molybdenum silicon multilayer films, Appl. Surf. Sci. 285, Part B (2013) 293-299.
V.V Medvedev, R.WE van de Kruijs, A.E Yakshin, N.N Novikova, V.M Krivtsun, E. Louis, A.M Yakunin, F. Bijkerk,  Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography, Appl. Phys. Lett. 22103 (2013) 221114.
I.A Makhotkin, E. Zoethout, R. van de Kruijs, S.N Yakunin, E. Louis, A.M Yakunin, V. Banine, S. Mullender, F. Bijkerk,  Short period La/B and LaN/B multilayer mirrors for similar to 6.8 nm wavelength, Opt. Express 2421 (2013) 29894-29904.
OA 
V.V Medvedev, A.JR van den Boogaard, R. van der Meer, A.E Yakshin, E. Louis, V.M Krivtsun, F. Bijkerk,  Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors, Opt. Express 1421 (2013) 16964-16974.
OA 
R. Sobierajski, R.A Loch, R.WE van de Kruijs, E. Louis, G. von Blanckenhagen, E.M Gullikson, F. Siewert, A. Wawro, F. Bijkerk,  Mo/Si multilayer-coated amplitude-division beam splitters for XUV radiation sources, J. Synchrotron Rad. 20 (2013) 249-257.
OA 
2012
A.JR van den Boogaard, E. Zoethout, I.A Makhotkin, E. Louis, F. Bijkerk,  Influence of noble gas ion polishing species on extreme ultraviolet mirrors, J. Appl. Phys. 12112 (2012) 123502.
I. Makhotkin, E. Zoethout, E. Louis, A.M Yakunin, S. Muellender, F. Bijkerk,  Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet, J. Micro-Nanolithogr. MEMS MOEMS 411 (2012) 040501.
OA 
E. Louis,  Physics and technology development of multilayer EUV reflective optics, PhD (2012) 
R.A Loch, R. Sobierajski, E. Louis, J. Bosgra, F. Bijkerk,  Modelling single shot damage thresholds of multilayer optics for high-intensity short-wavelength radiation sources, Opt. Express 2720 (2012) 28200–28215.
OA 
A.JR van den Boogaard, F.A van Goor, E. Louis, F. Bijkerk,  Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection, Opt. Lett. 237 (2012) 160-162.
F. Liu, C.J Lee, J.Q Chen, E. Louis, P.JM van der Slot, K.J Boller, F. Bijkerk,  Ellipsometry with randomly varying polarization states, Opt. Express 20 (2012) 870-878.
OA 
I.A Makhotkin, E. Zoethout, E. Louis, A.M Yakunin, S. Mullender, F. Bijkerk,  Spectral properties of La/B - based multilayer mirrors near the boron K absorption edge, Opt. Express 20 (2012) 11778-11786.
OA 
2011
R. Sobierajski, S. Bruijn, A.R Khorsand, E. Louis, R de Kruijs, T. Burian, J. Chalupsky, J. Cihelka, A. Gleeson, J. Grzonka et al.,  Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources, Opt. Express 119 (2011) 193-205.
OA 
A. Rouzee, P. Johnsson, E.V Gryzlova, H. Fukuzawa, A. Yamada, W. Siu, Y. Huismans, E. Louis, F. Bijkerk, D.MP Holland et al.,  Angle-resolved photoelectron spectroscopy of sequential three-photon triple ionization of neon at 90.5 eV photon energy, Phys. Rev. A 83 (2011) 031401.
I.A Makhotkin, E. Louis, R.WE van de Kruijs, A.E Yakshin, E. Zoethout, A.Y Seregin, E.Y Tereschenko, S.N Yakunin, F. Bijkerk,  Determination of the density of ultrathin La films in La/B(4)C layered structures using X-ray standing waves, Phys. Status Solidi A-Appl. Mat. 11208 (2011) 2597-2600.
E. Louis, A.E Yakshin, T. Tsarfati, F. Bijkerk,  Nanometer interface and materials control for multilayer EUV-optical applications, Prog. Surf. Sci. 86 (2011) 255-294.
J.Q Chen, E. Louis, R. Harmsen, T. Tsarfati, H. Wormeester, M. van Kampen, W. van Schaik, R. van de Kruijs, F. Bijkerk,  In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers, Appl. Surf. Sci. 258 (2011) 7-12.
J.Q Chen, E. Louis, H. Wormeester, R. Harmsen, R. van de Kruijs, C.J Lee, W. van Schaik, F. Bijkerk,  Carbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry, Meas. Sci. Technol. 22 (2011) 105705.

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