Publications
Model independent X-ray standing wave analysis of periodic multilayer structures, J. Appl. Phys. 115 (2014) 134303.
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High efficiency structured EUV multilayer mirror for spectral filtering of long wavelengths, Opt. Express 22 (2014) 19365-19374.
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Real-space insight in the nanometer scale roughness development during growth and ion beam polishing of molybdenum silicon multilayer films, Appl. Surf. Sci. 285, Part B (2013) 293-299.
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Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography, Appl. Phys. Lett. 22103 (2013) 221114.
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Short period La/B and LaN/B multilayer mirrors for similar to 6.8 nm wavelength, Opt. Express 2421 (2013) 29894-29904.
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Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors, Opt. Express 1421 (2013) 16964-16974.
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Mo/Si multilayer-coated amplitude-division beam splitters for XUV radiation sources, J. Synchrotron Rad. 20 (2013) 249-257.
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Influence of noble gas ion polishing species on extreme ultraviolet mirrors, J. Appl. Phys. 12112 (2012) 123502.
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Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet, J. Micro-Nanolithogr. MEMS MOEMS 411 (2012) 040501.
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Modelling single shot damage thresholds of multilayer optics for high-intensity short-wavelength radiation sources, Opt. Express 2720 (2012) 28200–28215.
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Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection, Opt. Lett. 237 (2012) 160-162.
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Spectral properties of La/B - based multilayer mirrors near the boron K absorption edge, Opt. Express 20 (2012) 11778-11786.
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Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources, Opt. Express 119 (2011) 193-205.
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Angle-resolved photoelectron spectroscopy of sequential three-photon triple ionization of neon at 90.5 eV photon energy, Phys. Rev. A 83 (2011) 031401.
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Determination of the density of ultrathin La films in La/B(4)C layered structures using X-ray standing waves, Phys. Status Solidi A-Appl. Mat. 11208 (2011) 2597-2600.
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Nanometer interface and materials control for multilayer EUV-optical applications, Prog. Surf. Sci. 86 (2011) 255-294.
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In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers, Appl. Surf. Sci. 258 (2011) 7-12.
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Carbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry, Meas. Sci. Technol. 22 (2011) 105705.
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