Publications

Export 53 results:
Author Title [ Type(Desc)] Year
Filters: Author is E. Louis  [Clear All Filters]
Journal Article
F. Bijkerk, E. Louis, G.E van Dorssen, A.P Shevelko, A.A VasilyevAbsolute Brightness of Laser Plasmas in the Soft-X-Ray Emission Band, Applied Optics 133 (1994) 82-88.
A. Rouzee, P. Johnsson, E.V Gryzlova, H. Fukuzawa, A. Yamada, W. Siu, Y. Huismans, E. Louis, F. Bijkerk, D.MP Holland et al.Angle-resolved photoelectron spectroscopy of sequential three-photon triple ionization of neon at 90.5 eV photon energy, Phys. Rev. A 83 (2011) 031401.
H.J Voorma, E. Louis, F. Bijkerk, S. AbdaliAngular and energy dependence of ion bombardment of Mo/Si multilayers, Journal of Applied Physics 482 (1997) 1876-1881.
J.Q Chen, E. Louis, H. Wormeester, R. Harmsen, R. van de Kruijs, C.J Lee, W. van Schaik, F. BijkerkCarbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry, Meas. Sci. Technol. 22 (2011) 105705.
A.JR van den Boogaard, E. Louis, E. Zoethout, K.A Goldberg, F. BijkerkCharacterization of Mo/Si multilayer growth on stepped topographies, J. Vac. Sci. Technol. B 29 (2011) 6.
OA 
H.J Voorma, E. Louis, N.B Koster, F. Bijkerk, E. SpillerCharacterization of multilayers by Fourier analysis of x-ray reflectivity, Journal of Applied Physics 981 (1997) 6112-6119.
R. Sobierajski, S. Bruijn, A.R Khorsand, E. Louis, R de Kruijs, T. Burian, J. Chalupsky, J. Cihelka, A. Gleeson, J. Grzonka et al.Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources, Opt. Express 119 (2011) 193-205.
OA 
J.Q Chen, E. Louis, C.J Lee, H. Wormeester, R. Kunze, H. Schmidt, D. Schneider, R. Moors, W. van Schaik, M. Lubomska et al.Detection and characterization of carbon contamination on EUV multilayer mirrors, Opt. Express 1917 (2009) 16969-16979.
S. Abdali, L. Gerward, A.E Yakshin, E. Louis, F. BijkerkDetermination of crystallization as a function of Mo layer thickness in Mo/Si multilayers, Materials Research Bulletin 237 (2002) 279-289.
I.A Makhotkin, E. Louis, R.WE van de Kruijs, A.E Yakshin, E. Zoethout, A.Y Seregin, E.Y Tereschenko, S.N Yakunin, F. BijkerkDetermination of the density of ultrathin La films in La/B(4)C layered structures using X-ray standing waves, Phys. Status Solidi A-Appl. Mat. 11208 (2011) 2597-2600.
F. Liu, C.J Lee, J.Q Chen, E. Louis, P.JM van der Slot, K.J Boller, F. BijkerkEllipsometry with randomly varying polarization states, Opt. Express 20 (2012) 870-878.
OA 
E. Louis, H.J Voorma, N.B Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Y.Y Platonov, G.E van Dorssen, H.A PadmoreEnhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment, Microelectronic Engineering 1-423 (1994) 215-218.
H.J Voorma, G.E van Dorssen, E. Louis, N.B Koster, A.D Smith, M.D Roper, F. BijkerkEXAFS measurements on the structure of Mo/Si multilayers produced using ion bombardment and increased deposition temperature, Applied Surface Science 393 (1996) 221-230.
F. Bijkerk, L.A Shmaenok, E. Louis, H.J Voorma, N.B Koster, C. Bruineman, R Bastiaensen, E.WJM van der Drift, J. Romijn, L.EM de Groot et al.Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks, Microelectronic Engineering 1-430 (1996) 183-186.
H.J Voorma, E. Louis, N.B Koster, F. Bijkerk, T. Zijlstra, L.EM de Groot, B.AC Rousseeuw, J. Romijn, E.WJM van der Drift, J. FriedrichFabrication and analysis of extreme ultraviolet reflection masks with patterned W/C absorber bilayers, Journal of Vacuum Science & Technology B 215 (1997) 293-298.
S. Dobrovolskiy, A.E Yakshin, F.D Tichelaar, J. Verhoeven, E. Louis, F. BijkerkFormation of Si/SiC multilayers by low-energy ion implantation and thermal annealing, Nucl. Instrum. Methods Phys. Res. Sect. B-Beam Interact. Mater. Atoms 6268 (2010) 560-567.
Q. Huang, M. de Boer, J. Barreaux, R. van der Meer, E. Louis, F. BijkerkHigh efficiency structured EUV multilayer mirror for spectral filtering of long wavelengths, Opt. Express 22 (2014) 19365-19374.
OA 
F. Bijkerk, E. Louis, E.CI Turcu, G.J TallentsHigh Repetition Rate Krf Laser Plasma X-Ray Source for Microlithography, Microelectronic Engineering 1-417 (1992) 219-222.
L Alink, R.W.E. de Kruijs, E. Louis, F. Bijkerk, J. VerhoevenImproved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions, Thin Solid Films 1-2510 (2006) 26-31.

Pages