Publications

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Journal Article
S. Dobrovolskiy, A.E Yakshin, M.JH Kessels, J. VerhoevenThe application of energetic CHx+ ions to form a Si/SiC multilayer system for reflection of radiation between 20 and 80 nm, Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms 3-4237 (2005) 533-542.
E.J Puik, G.E van Dorssen, M.J van der Wiel, J. Verhoeven, G. Vanderlaan, H.A PadmoreCharacterization of the Resolving Power of a Double Multilayer Monochromator in the Energy-Range of 600-900 Ev, Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films 69 (1991) 3142-3148.
M.JH Kessels, F. Bijkerk, F.D Tichelaar, J. VerhoevenDetermination of in-depth density profiles of multilayer structures, Journal of Applied Physics 997 (2005) 
R. Schlatmann, A. Keppel, Y. Xue, J. Verhoeven, M.J van der WielEnhanced Reflectivity of Soft-X-Ray Multilayer Mirrors by Reduction of Si Atomic Density, Applied Physics Letters 2463 (1993) 3297-3299.
E. Louis, H.J Voorma, N.B Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Y.Y Platonov, G.E van Dorssen, H.A PadmoreEnhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment, Microelectronic Engineering 1-423 (1994) 215-218.
S. Dobrovolskiy, A.E Yakshin, F.D Tichelaar, J. Verhoeven, E. Louis, F. BijkerkFormation of Si/SiC multilayers by low-energy ion implantation and thermal annealing, Nucl. Instrum. Methods Phys. Res. Sect. B-Beam Interact. Mater. Atoms 6268 (2010) 560-567.
L Alink, R.W.E. de Kruijs, E. Louis, F. Bijkerk, J. VerhoevenImproved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions, Thin Solid Films 1-2510 (2006) 26-31.
J. Bosgra, L.W Veldhuizen, E. Zoethout, J. Verhoeven, R.A Loch, A.E Yakshin, F. BijkerkInteractions of C in layered Mo-Si structures, Thin Solid Films 542 (2013) 210-213.
OA 
M.JH Kessels, J. Verhoeven, A.E Yakshin, F.D Tichelaar, F. BijkerkIon beam induced intermixing of interface structures in W/Si multilayers, Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms 3-4222 (2004) 484-490.
F.J Puik, M.J van der Wiel, H. Zeijlemaker, J. VerhoevenIon Etching of Thin W-Layers - Enhanced Reflectivity of W-C Multilayer Coatings, Applied Surface Science 147 (1991) 63-76.
E.J Puik, M.J van der Wiel, H. Zeijlemaker, J. VerhoevenIon-Bombardment of Thin-Layers - the Effect on the Interface Roughness and Its X-Ray Reflectivity, Review of Scientific Instruments 163 (1992) 1415-1419.
E.J Puik, M.J van der Wiel, H. Zeijlemaker, J. VerhoevenIon-Bombardment of X-Ray Multilayer Coatings - Comparison of Ion Etching and Ion Assisted Deposition, Applied Surface Science 347 (1991) 251-260.
M.JH Kessels, J. Verhoeven, F.D Tichelaar, F. BijkerkIon-induced interface layer formation in W/Si and WRe/Si multilayers, Surface Science 1-3582 (2005) 227-234.
R. Schlatmann, C. Lu, J. Verhoeven, E.J Puik, M.J van der WielModification by Ar and Kr Ion-Bombardment of Mo/Si X-Ray Multilayers, Applied Surface Science 278 (1994) 147-157.
J. Bosgra, J. Verhoeven, R.WE van de Kruijs, A.E Yakshin, F. BijkerkNon-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth, Thin Solid Films 522 (2012) 228–232.
V de Rooij-Lohmann, A.E Yakshin, E. Zoethout, J. Verhoeven, F. BijkerkReduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection, Appl. Surf. Sci. 257 (2011) 6251-6255.
H. Vanbrug, M.J van der Wiel, R. Vanderpol, J. Verhoeven, G. Vanderlaan, J.B GoedkoopReflection Extended X-Ray Absorption Fine-Structure Measurements on Ni/C and Nixsiy/C Multilayered Reflection Coatings, Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films 46 (1988) 2182-2187.
E.J Puik, M.J van der Wiel, H. Zeijlemaker, J. VerhoevenThe Role of Layer Growth on Interface Roughness in Ni-C Multilayer X-Ray Mirrors, Vacuum 8-1038 (1988) 707-709.
J.Q Chen, E. Louis, J. Verhoeven, R. Harmsen, C.J Lee, M. Lubomska, M. van Kampen, W. van Schaik, F. BijkerkSecondary electron yield measurements of carbon covered multilayer optics, Appl. Surf. Sci. 2257 (2010) 354-361.
M.JH Kessels, J. Verhoeven, F.D Tichelaar, F. BijkerkSi adhesion interlayer effects in hydrogen passivated Si/W soft X-ray multilayer mirrors, Surface Science 6600 (2006) 1405-1408.

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