Publications

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B. Narayanan, S.L Weeks, B.N Jariwala, B. Macco, J. Weber, S.J Rathi, M.CM van de Sanden, P. Sutter, S. Agarwal, C.V CiobanuCarbon monoxide-induced reduction and healing of graphene oxide, J. Vac. Sci. Technol. A 431 (2013) 040601.
I. Dogan, M.CM van de SandenCharacterization of Nanocrystal Size Distribution Using Raman Spectroscopy with a Multi-particle Phonon Confinement Model, J. Vis. Exp. 2015 (2015) e53026.
OA 
K. Bystrov, T.W Morgan, I. Tanyeli, G. De Temmerman, M.CM van de SandenChemical sputtering of graphite by low temperature nitrogen plasmas at various substrate temperatures and ion flux densities, J. Appl. Phys. 13114 (2013) 133301.
OA PDF icon 2013_54614.pdf (4.43 MB)
F. Brehmer, S. Welzel, M.CM van de Sanden, R. EngelnCO and byproduct formation during CO2 reduction in dielectric barrier discharges, J. Appl. Phys. 12116 (2014) 123303.
G. Dingemans, N.M Terlinden, M.A Verheijen, M.CM van de Sanden, W.MM KesselsControlling the fixed charge and passivation properties of Si(100)/Al(2)O(3) interfaces using ultrathin SiO(2) interlayers synthesized by atomic layer deposition, J. Appl. Phys. 110 (2011) 6.
M.V Ponomarev, M.A Verheijen, W. Keuning, M.CM van de Sanden, M. CreatoreControlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition (vol 112, 043708, 2012), J. Appl. Phys. 6112 (2012) 1.
M.V Ponomarev, M.A Verheijen, W. Keuning, M.CM van de Sanden, M. CreatoreControlling the resistivity gradient in chemical vapor deposition-deposited aluminum-doped zinc oxide, J. Appl. Phys. 112 (2012) 04370.
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W.EN van Harskamp, C.M Brouwer, D.C. Schram, M.CM van de Sanden, R. EngelnDetailed H(n=2) density measurements in a magnetized hydrogen plasma jet, Plasma Sources Sci. Technol. 21 (2012) 024009.
W.A Bongers, S. Welzel, D.CM van den Bekerom, G.FWM Frissen, G.J van Rooij, A.PH Goede, MF Graswinckel, P.WC Groen, N. den Harder, B. van Heemert et al.Developments in CO2 dissociation using non-equilibrium microwave plasma activation for solar fuels, ISPC 22  (2015) OA 
W. Bongers, A.PH Goede, MF Graswinckel, S. Welzel, M. Leins, J. Kopecki, A. Schulz, M. Walker, M.CM van de SandenDevelopments in power efficient dissociation of CO2 using non-equilibrium microwave plasma activation for solar fuels from sustainable energy, 9th International Workshop “Strong Microwaves and Terahertz Waves: Sources and Applications” SMTW9  (2014) 
K.B Jinesh, J.L van Hemmen, M.CM van de Sanden, F. Roozeboom, J.H Klootwijk, W.FA Besling, W.MM KesselsDielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films, J. Electrochem. Soc. 158 (2011) G21-G26.
S. Longo, P. Viegas, M.CM van de Sanden, P. DiomedeA diffusion approach to vibrational kinetics of molecules in plasma, EPS 46  (2019) I4.301.
OA PDF icon 190708_eps_abs_longo_I4.301.pdf (79.89 KB)
I. Dogan, M.CM van de SandenDirect characterization of nanocrystal size distribution using Raman spectroscopy, Journal of Applied Physics 114 (2013) 134310.
A.C Bronneberg, X. Kang, J. Palmans, P.HJ Janssen, T. Lorne, M. Creatore, M.CM van de SandenDirect ion flux measurements at high-pressure-depletion conditions for microcrystalline silicon deposition, J. Appl. Phys. 114 (2013) 063305.
S.A Starostin, S. Welzel, B.CAM van der Velden, Y. Liu, J.B Bouwstra, M.CM van de Sanden, H.W de VriesDynamics of the atmospheric pressure diffuse dielectric barrier discharge between cylindrical electrodes in roll-to-roll PECVD reactor, Eur. Phys. J. Appl. Phys. 271 (2015) 20803.

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