Publications

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Author Title [ Type(Desc)] Year
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Book Chapter
M.CM van de SandenHoezo de wereld redden? Mee met morgen: Vijftig korte essays over de toekomst van de wetenschap en kunst samengebracht door de Koninklijke Vlaamse Academie van België voor Wetenschappen en Kunsten  (2015) 139-141.
Journal Article
H.CM Knoops, M.E Donders, M.CM van de Sanden, P.HL Notten, W.MM KesselsAtomic layer deposition for nanostructured Li-ion batteries, J. Vac. Sci. Technol. A 30 (2012) 010801.
N. Leick, R.OF Verkuijlen, L. Lamagna, E. Langereis, S. Rushworth, F. Roozeboom, M.CM van de Sanden, W.MM KesselsAtomic layer deposition of Ru from CpRu(CO)(2)Et using O-2 gas and O-2 plasma, J. Vac. Sci. Technol. A 29 (2011) 021016.
B. Narayanan, S.L Weeks, B.N Jariwala, B. Macco, J. Weber, S.J Rathi, M.CM van de Sanden, P. Sutter, S. Agarwal, C.V CiobanuCarbon monoxide-induced reduction and healing of graphene oxide, J. Vac. Sci. Technol. A 431 (2013) 040601.
I. Dogan, M.CM van de SandenCharacterization of Nanocrystal Size Distribution Using Raman Spectroscopy with a Multi-particle Phonon Confinement Model, J. Vis. Exp. 2015 (2015) e53026.
OA 
K. Bystrov, T.W Morgan, I. Tanyeli, G. De Temmerman, M.CM van de SandenChemical sputtering of graphite by low temperature nitrogen plasmas at various substrate temperatures and ion flux densities, J. Appl. Phys. 13114 (2013) 133301.
OA PDF icon 2013_54614.pdf (4.43 MB)
F. Brehmer, S. Welzel, M.CM van de Sanden, R. EngelnCO and byproduct formation during CO2 reduction in dielectric barrier discharges, J. Appl. Phys. 12116 (2014) 123303.
G. Dingemans, N.M Terlinden, M.A Verheijen, M.CM van de Sanden, W.MM KesselsControlling the fixed charge and passivation properties of Si(100)/Al(2)O(3) interfaces using ultrathin SiO(2) interlayers synthesized by atomic layer deposition, J. Appl. Phys. 110 (2011) 6.
M.V Ponomarev, M.A Verheijen, W. Keuning, M.CM van de Sanden, M. CreatoreControlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition (vol 112, 043708, 2012), J. Appl. Phys. 6112 (2012) 1.
M.V Ponomarev, M.A Verheijen, W. Keuning, M.CM van de Sanden, M. CreatoreControlling the resistivity gradient in chemical vapor deposition-deposited aluminum-doped zinc oxide, J. Appl. Phys. 112 (2012) 04370.
W.EN van Harskamp, C.M Brouwer, D.C. Schram, M.CM van de Sanden, R. EngelnDetailed H(n=2) density measurements in a magnetized hydrogen plasma jet, Plasma Sources Sci. Technol. 21 (2012) 024009.
K.B Jinesh, J.L van Hemmen, M.CM van de Sanden, F. Roozeboom, J.H Klootwijk, W.FA Besling, W.MM KesselsDielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films, J. Electrochem. Soc. 158 (2011) G21-G26.
I. Dogan, M.CM van de SandenDirect characterization of nanocrystal size distribution using Raman spectroscopy, Journal of Applied Physics 114 (2013) 134310.
A.C Bronneberg, X. Kang, J. Palmans, P.HJ Janssen, T. Lorne, M. Creatore, M.CM van de SandenDirect ion flux measurements at high-pressure-depletion conditions for microcrystalline silicon deposition, J. Appl. Phys. 114 (2013) 063305.
S.A Starostin, S. Welzel, B.CAM van der Velden, Y. Liu, J.B Bouwstra, M.CM van de Sanden, H.W de VriesDynamics of the atmospheric pressure diffuse dielectric barrier discharge between cylindrical electrodes in roll-to-roll PECVD reactor, Eur. Phys. J. Appl. Phys. 271 (2015) 20803.
A. Illiberi, P. Kudlacek, A.HM Smets, M. Creatore, M.CM van de SandenEffect of ion bombardment on the a-Si:H based surface passivation of c-Si surfaces, Appl. Phys. Lett. 98 (2011) 3.
K. Sharma, A. Branca, A. Illiberi, F.D Tichelaar, M. Creatore, M.CM van de SandenOn the Effect of the Amorphous Silicon Microstructure on the Grain Size of Solid Phase Crystallized Polycrystalline Silicon, Adv. Energy Mater. 1 (2011) 401-406.
K. Sharma, M.V Ponomarev, M.CM van de Sanden, M. CreatoreOn the effect of the underlying ZnO:Al layer on the crystallization kinetics of hydrogenated amorphous silicon, Applied Physics Letters 21102 (2013) 212107.

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