Publications
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Author Title Type [ Year
Filters: Author is M. C. M. van de Sanden [Clear All Filters]
Investigating the flow dynamics and chemistry of an expanding thermal plasma through CH(A-X) emission spectra, J. Phys. D-Appl. Phys. 44 (2011) 355205.
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Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges, J. Vac. Sci. Technol. A 29 (2011) 26.
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Improved adhesion and tribological properties of fast-deposited hard graphite-like hydrogenated amorphous carbon films, Diam. Relat. Mat. 20 (2011) 1266-1272.
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Surface Hydride Composition of Plasma-Synthesized Si Nanoparticles, J. Phys. Chem. C 115 (2011) 20375-20379.
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Controlling the fixed charge and passivation properties of Si(100)/Al(2)O(3) interfaces using ultrathin SiO(2) interlayers synthesized by atomic layer deposition, J. Appl. Phys. 110 (2011) 6.
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Effective passivation of Si surfaces by plasma deposited SiOx/a-SiNx:H stacks, Appl. Phys. Lett. 98 (2011) 222102.
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On the Effect of the Amorphous Silicon Microstructure on the Grain Size of Solid Phase Crystallized Polycrystalline Silicon, Adv. Energy Mater. 1 (2011) 401-406.
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Atomic layer deposition of Ru from CpRu(CO)(2)Et using O-2 gas and O-2 plasma, J. Vac. Sci. Technol. A 29 (2011) 021016.
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Population inversion in a magnetized hydrogen plasma expansion as a consequence of the molecular mutual neutralization process, Phys. Rev. E 83 (2011) 036412.
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Effect of ion bombardment on the a-Si:H based surface passivation of c-Si surfaces, Appl. Phys. Lett. 98 (2011) 3.
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Er3+ and Si luminescence of atomic layer deposited Er-doped Al2O3 thin films on Si(100), J. Appl. Phys. 109 (2011) 9.
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Plasma-Assisted Deposition of Au/SiO2 Multi-layers as Surface Plasmon Resonance-Based Red-Colored Coatings, Plasmonics 6 (2011) 255-260.
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Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film, Phys. Status Solidi-Rapid Res. Lett. 5 (2011) 22-24.
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On the oxidation mechanism of microcrystalline silicon thin films studied by Fourier transform infrared spectroscopy, J. Non-Cryst. Solids 357 (2011) 884-887.
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In-situ transmission measurements as process control for thin-film silicon solar cells, Sol. Energy Mater. Sol. Cells 95 (2011) 3328-3332.
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Microfocus infrared ellipsometry characterization of air-exposed graphene flakes, Appl. Phys. Lett. 99 (2011) 3.
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Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films, J. Electrochem. Soc. 158 (2011) G21-G26.
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Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3, Electrochem. Solid State Lett. 14 (2011) H1-H4.
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Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides, J. Electrochem. Soc. 158 (2011) G88-G91.
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Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors, J. Electrochem. Soc. 158 (2011) G34-G38.
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