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T.AR Hansen, P.GJ Colsters, M.CM van de Sanden, R. EngelnInvestigating the flow dynamics and chemistry of an expanding thermal plasma through CH(A-X) emission spectra, J. Phys. D-Appl. Phys. 44 (2011) 355205.
H.B Profijt, S.E Potts, M.CM van de Sanden, W.MM KesselsPlasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges, J. Vac. Sci. Technol. A 29 (2011) 26.
T. Zaharia, P. Kudlacek, M. Creatore, R. Groenen, P. Persoone, M.CM van de SandenImproved adhesion and tribological properties of fast-deposited hard graphite-like hydrogenated amorphous carbon films, Diam. Relat. Mat. 20 (2011) 1266-1272.
B.N Jariwala, N.J Kramer, M.C Petcu, D.C Bobela, M.CM van de Sanden, P. Stradins, C.V Ciobanu, S. AgarwalSurface Hydride Composition of Plasma-Synthesized Si Nanoparticles, J. Phys. Chem. C 115 (2011) 20375-20379.
G. Dingemans, N.M Terlinden, M.A Verheijen, M.CM van de Sanden, W.MM KesselsControlling the fixed charge and passivation properties of Si(100)/Al(2)O(3) interfaces using ultrathin SiO(2) interlayers synthesized by atomic layer deposition, J. Appl. Phys. 110 (2011) 6.
G. Dingemans, M.M Mandoc, S. Bordihn, M.CM van de Sanden, W.MM KesselsEffective passivation of Si surfaces by plasma deposited SiOx/a-SiNx:H stacks, Appl. Phys. Lett. 98 (2011) 222102.
K. Sharma, A. Branca, A. Illiberi, F.D Tichelaar, M. Creatore, M.CM van de SandenOn the Effect of the Amorphous Silicon Microstructure on the Grain Size of Solid Phase Crystallized Polycrystalline Silicon, Adv. Energy Mater. 1 (2011) 401-406.
N. Leick, R.OF Verkuijlen, L. Lamagna, E. Langereis, S. Rushworth, F. Roozeboom, M.CM van de Sanden, W.MM KesselsAtomic layer deposition of Ru from CpRu(CO)(2)Et using O-2 gas and O-2 plasma, J. Vac. Sci. Technol. A 29 (2011) 021016.
W.EN van Harskamp, C.M Brouwer, D.C. Schram, M.CM van de Sanden, R. EngelnPopulation inversion in a magnetized hydrogen plasma expansion as a consequence of the molecular mutual neutralization process, Phys. Rev. E 83 (2011) 036412.
A. Illiberi, P. Kudlacek, A.HM Smets, M. Creatore, M.CM van de SandenEffect of ion bombardment on the a-Si:H based surface passivation of c-Si surfaces, Appl. Phys. Lett. 98 (2011) 3.
G. Dingemans, A. Clark, J.A van Delft, M.CM van de Sanden, W.MM KesselsEr3+ and Si luminescence of atomic layer deposited Er-doped Al2O3 thin films on Si(100), J. Appl. Phys. 109 (2011) 9.
H.T Beyene, F.D Tichelaar, M.A Verheijen, M.CM van de Sanden, M. CreatorePlasma-Assisted Deposition of Au/SiO2 Multi-layers as Surface Plasmon Resonance-Based Red-Colored Coatings, Plasmonics 6 (2011) 255-260.
G. Dingemans, M.CM van de Sanden, W.MM KesselsExcellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film, Phys. Status Solidi-Rapid Res. Lett. 5 (2011) 22-24.
A.C Bronneberg, A.HM Smets, M. Creatore, M.CM van de SandenOn the oxidation mechanism of microcrystalline silicon thin films studied by Fourier transform infrared spectroscopy, J. Non-Cryst. Solids 357 (2011) 884-887.
M. Meier, S. Muthmann, A.J Flikweert, G. Dingemans, M.CM van de Sanden, A. GordijnIn-situ transmission measurements as process control for thin-film silicon solar cells, Sol. Energy Mater. Sol. Cells 95 (2011) 3328-3332.
J.W Weber, K. Hinrichs, M. Gensch, M.CM van de Sanden, T.WH OatesMicrofocus infrared ellipsometry characterization of air-exposed graphene flakes, Appl. Phys. Lett. 99 (2011) 3.
K.B Jinesh, J.L van Hemmen, M.CM van de Sanden, F. Roozeboom, J.H Klootwijk, W.FA Besling, W.MM KesselsDielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films, J. Electrochem. Soc. 158 (2011) G21-G26.
G. Dingemans, N.M Terlinden, D. Pierreux, H.B Profijt, M.CM van de Sanden, W.MM KesselsInfluence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3, Electrochem. Solid State Lett. 14 (2011) H1-H4.
H.B Profijt, P. Kudlacek, M.CM van de Sanden, W.MM KesselsIon and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides, J. Electrochem. Soc. 158 (2011) G88-G91.
E. Langereis, R. Roijmans, F. Roozeboom, M.CM van de Sanden, W.MM KesselsRemote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors, J. Electrochem. Soc. 158 (2011) G34-G38.