Publications

Export 77 results:
Author Title Type [ Year(Desc)]
Filters: Author is M. C. M. van de Sanden  [Clear All Filters]
2011
T.AR Hansen, P.GJ Colsters, M.CM van de Sanden, R. Engeln,  Investigating the flow dynamics and chemistry of an expanding thermal plasma through CH(A-X) emission spectra, J. Phys. D-Appl. Phys. 44 (2011) 355205.
H.B Profijt, S.E Potts, M.CM van de Sanden, W.MM Kessels,  Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges, J. Vac. Sci. Technol. A 29 (2011) 26.
T. Zaharia, P. Kudlacek, M. Creatore, R. Groenen, P. Persoone, M.CM van de Sanden,  Improved adhesion and tribological properties of fast-deposited hard graphite-like hydrogenated amorphous carbon films, Diam. Relat. Mat. 20 (2011) 1266-1272.
B.N Jariwala, N.J Kramer, M.C Petcu, D.C Bobela, M.CM van de Sanden, P. Stradins, C.V Ciobanu, S. Agarwal,  Surface Hydride Composition of Plasma-Synthesized Si Nanoparticles, J. Phys. Chem. C 115 (2011) 20375-20379.
G. Dingemans, N.M Terlinden, M.A Verheijen, M.CM van de Sanden, W.MM Kessels,  Controlling the fixed charge and passivation properties of Si(100)/Al(2)O(3) interfaces using ultrathin SiO(2) interlayers synthesized by atomic layer deposition, J. Appl. Phys. 110 (2011) 6.
G. Dingemans, M.M Mandoc, S. Bordihn, M.CM van de Sanden, W.MM Kessels,  Effective passivation of Si surfaces by plasma deposited SiOx/a-SiNx:H stacks, Appl. Phys. Lett. 98 (2011) 222102.
K. Sharma, A. Branca, A. Illiberi, F.D Tichelaar, M. Creatore, M.CM van de Sanden,  On the Effect of the Amorphous Silicon Microstructure on the Grain Size of Solid Phase Crystallized Polycrystalline Silicon, Adv. Energy Mater. 1 (2011) 401-406.
N. Leick, R.OF Verkuijlen, L. Lamagna, E. Langereis, S. Rushworth, F. Roozeboom, M.CM van de Sanden, W.MM Kessels,  Atomic layer deposition of Ru from CpRu(CO)(2)Et using O-2 gas and O-2 plasma, J. Vac. Sci. Technol. A 29 (2011) 021016.
W.EN van Harskamp, C.M Brouwer, D.C. Schram, M.CM van de Sanden, R. Engeln,  Population inversion in a magnetized hydrogen plasma expansion as a consequence of the molecular mutual neutralization process, Phys. Rev. E 83 (2011) 036412.
A. Illiberi, P. Kudlacek, A.HM Smets, M. Creatore, M.CM van de Sanden,  Effect of ion bombardment on the a-Si:H based surface passivation of c-Si surfaces, Appl. Phys. Lett. 98 (2011) 3.
G. Dingemans, A. Clark, J.A van Delft, M.CM van de Sanden, W.MM Kessels,  Er3+ and Si luminescence of atomic layer deposited Er-doped Al2O3 thin films on Si(100), J. Appl. Phys. 109 (2011) 9.
H.T Beyene, F.D Tichelaar, M.A Verheijen, M.CM van de Sanden, M. Creatore,  Plasma-Assisted Deposition of Au/SiO2 Multi-layers as Surface Plasmon Resonance-Based Red-Colored Coatings, Plasmonics 6 (2011) 255-260.
G. Dingemans, M.CM van de Sanden, W.MM Kessels,  Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film, Phys. Status Solidi-Rapid Res. Lett. 5 (2011) 22-24.
A.C Bronneberg, A.HM Smets, M. Creatore, M.CM van de Sanden,  On the oxidation mechanism of microcrystalline silicon thin films studied by Fourier transform infrared spectroscopy, J. Non-Cryst. Solids 357 (2011) 884-887.
M. Meier, S. Muthmann, A.J Flikweert, G. Dingemans, M.CM van de Sanden, A. Gordijn,  In-situ transmission measurements as process control for thin-film silicon solar cells, Sol. Energy Mater. Sol. Cells 95 (2011) 3328-3332.
J.W Weber, K. Hinrichs, M. Gensch, M.CM van de Sanden, T.WH Oates,  Microfocus infrared ellipsometry characterization of air-exposed graphene flakes, Appl. Phys. Lett. 99 (2011) 3.
K.B Jinesh, J.L van Hemmen, M.CM van de Sanden, F. Roozeboom, J.H Klootwijk, W.FA Besling, W.MM Kessels,  Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films, J. Electrochem. Soc. 158 (2011) G21-G26.
G. Dingemans, N.M Terlinden, D. Pierreux, H.B Profijt, M.CM van de Sanden, W.MM Kessels,  Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3, Electrochem. Solid State Lett. 14 (2011) H1-H4.
H.B Profijt, P. Kudlacek, M.CM van de Sanden, W.MM Kessels,  Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides, J. Electrochem. Soc. 158 (2011) G88-G91.
E. Langereis, R. Roijmans, F. Roozeboom, M.CM van de Sanden, W.MM Kessels,  Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors, J. Electrochem. Soc. 158 (2011) G34-G38.

Pages