Publications
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Author Title Type [ Year
Filters: Author is Kessels, W. M. M. [Clear All Filters]
Enhancing the Electrocatalytic Activity of Redox Stable Perovskite Fuel Electrodes in Solid Oxide Cells by Atomic Layer-Deposited Pt Nanoparticles, ACS Sustainable Chem. Eng. 8 (2020) 12646–12654.
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Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction, Electrochem. Commun. 98 (2019) 73-77.
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On the synergistic effect of inorganic/inorganic barrier layers: An ellipsometric porosimetry investigation, Plasma Processes Polym. 14 (2017) 1700012.
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Atomic layer deposition of highly dispersed Pt nanoparticles on a high surface area electrode backbone for electrochemical promotion of catalysis, Electrochem. Commun. 84 (2017) 40-44.
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2017_67501.pdf (426.08 KB)
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Atomic hydrogen induced defect kinetics in amorphous silicon, J. Vac. Sci. Technol. A 35 (2017) 05C307.
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2017_66993.pdf (616.89 KB)
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Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers, Plasma Processes Polym. 13 (2016) 311-315.
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2016_64579.pdf (426.5 KB)
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In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd, J. Phys. D: Appl. Phys. 49 (2016) 115504.
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Erratum: In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd (2016 J. Phys. D: Appl. Phys . 49 115504), J. Phys. D: Appl. Phys. 49 (2016) 269601.
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The impact of the nano-pore filling on the performance of organosilicon-based moisture barriers, Thin Solid Films 595, Part B (2015) 251-257.
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On the role of nanoporosity in controlling the performance of moisture permeation barrier layers, Microporous and Mesoporous Materials 188 (2014) 163-171.
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Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO(2) Thin Films, Electrochem. Solid State Lett. 15 (2012) G1-G3.
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Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses, Plasma Processes and Polymers 9 (2012) 761-771.
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Surface passivation of phosphorus-diffused n(+)-type emitters by plasma-assisted atomic-layer deposited Al2O3, Phys. Status Solidi-Rapid Res. Lett. 6 (2012) 4-6.
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Reaction mechanisms of atomic layer deposition of TaN(x) from Ta(NMe(2))(5) precursor and H(2)-based plasmas, J. Vac. Sci. Technol. A 30 (2012) 01A101.
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Atomic layer deposition for nanostructured Li-ion batteries, J. Vac. Sci. Technol. A 30 (2012) 010801.
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Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface, Journal of Applied Physics 111 (2012) 093713.
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Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors, J. Electrochem. Soc. 158 (2011) G34-G38.
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Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides, J. Electrochem. Soc. 158 (2011) G88-G91.
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Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3, Electrochem. Solid State Lett. 14 (2011) H1-H4.
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