Publications

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2019
V. di Palma, G. Zafeiropoulos, T. Goldsweer, W.MM Kessels, M.CM van de Sanden, M. Creatore, M.N Tsampas,  Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction, Electrochem. Commun. 98 (2019) 73-77.
OA 
2017
M. Aghaee, A. Perrotta, S.A Starostin, H.W de Vries, M.CM van de Sanden, W.MM Kessels, M. Creatore,  On the synergistic effect of inorganic/inorganic barrier layers: An ellipsometric porosimetry investigation, Plasma Processes Polym. 14 (2017) 1700012.
Y. Hajar, V. di Palma, V. Kyriakou, M.A Verheijen, E.A Baranova, P. Vernoux, W.MM Kessels, M. Creatore, M.CM van de Sanden, M.N Tsampas,  Atomic layer deposition of highly dispersed Pt nanoparticles on a high surface area electrode backbone for electrochemical promotion of catalysis, Electrochem. Commun. 84 (2017) 40-44.
F.JJ Peeters, J. Zheng, I.MP Aarts, A.CR Pipino, W.MM Kessels, M.CM van de Sanden,  Atomic hydrogen induced defect kinetics in amorphous silicon, J. Vac. Sci. Technol. A 35 (2017) 05C307.
OA PDF icon 2017_66993.pdf (616.89 KB)
2016
S.A Starostin, W. Keuning, J. Schalken, M. Creatore, W.MM Kessels, J.B Bouwstra, M.CM van de Sanden, H.W de Vries,  Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers, Plasma Processes Polym. 13 (2016) 311-315.
OA PDF icon 2016_64579.pdf (426.5 KB)
N. Leick, J.W Weber, A.JM Mackus, M.J Weber, M.CM van de Sanden, W.MM Kessels,  In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd, J. Phys. D: Appl. Phys. 49 (2016) 115504.
N. Leick, J.W Weber, A.JM Mackus, M.J Weber, M.CM van de Sanden, W.MM Kessels,  Erratum: In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd (2016 J. Phys. D: Appl. Phys . 49 115504), J. Phys. D: Appl. Phys. 49 (2016) 269601.
2015
A. Perrotta, G. Aresta, E.RJ van Beekum, J. Palmans, P. van de Weijer, M.CM van de Sanden, W.MM Kessels, M. Creatore,  The impact of the nano-pore filling on the performance of organosilicon-based moisture barriers, Thin Solid Films 595, Part B (2015) 251-257.
2014
A. Perrotta, E.RJ van Beekum, G. Aresta, A. Jagia, W. Keuning, M.CM van de Sanden, W.MM Kessels, M. Creatore,  On the role of nanoporosity in controlling the performance of moisture permeation barrier layers, Microporous and Mesoporous Materials 188 (2014) 163-171.
2012
H.B Profijt, M.CM van de Sanden, W.MM Kessels,  Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO(2) Thin Films, Electrochem. Solid State Lett. 15 (2012) G1-G3.
G. Dingemans, M.CM van de Sanden, W.MM Kessels,  Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses, Plasma Processes and Polymers 9 (2012) 761-771.
B. Hoex, M.CM van de Sanden, J. Schmidt, R. Brendel, W.MM Kessels,  Surface passivation of phosphorus-diffused n(+)-type emitters by plasma-assisted atomic-layer deposited Al2O3, Phys. Status Solidi-Rapid Res. Lett. 6 (2012) 4-6.
OA 
H.CM Knoops, E. Langereis, M.CM van de Sanden, W.MM Kessels,  Reaction mechanisms of atomic layer deposition of TaN(x) from Ta(NMe(2))(5) precursor and H(2)-based plasmas, J. Vac. Sci. Technol. A 30 (2012) 01A101.
H.CM Knoops, M.E Donders, M.CM van de Sanden, P.HL Notten, W.MM Kessels,  Atomic layer deposition for nanostructured Li-ion batteries, J. Vac. Sci. Technol. A 30 (2012) 010801.
G. Dingemans, F. Einsele, W. Beyer, M.CM van de Sanden, W.MM Kessels,  Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface, Journal of Applied Physics 111 (2012) 093713.
2011
M.E Donders, H.CM Knoops, M.CM van de Sanden, W.MM Kessels, P.HL Notten,  Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films, J. Electrochem. Soc. 158 (2011) G92-G96.
E. Langereis, R. Roijmans, F. Roozeboom, M.CM van de Sanden, W.MM Kessels,  Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors, J. Electrochem. Soc. 158 (2011) G34-G38.
H.B Profijt, P. Kudlacek, M.CM van de Sanden, W.MM Kessels,  Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides, J. Electrochem. Soc. 158 (2011) G88-G91.
G. Dingemans, N.M Terlinden, D. Pierreux, H.B Profijt, M.CM van de Sanden, W.MM Kessels,  Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3, Electrochem. Solid State Lett. 14 (2011) H1-H4.
K.B Jinesh, J.L van Hemmen, M.CM van de Sanden, F. Roozeboom, J.H Klootwijk, W.FA Besling, W.MM Kessels,  Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films, J. Electrochem. Soc. 158 (2011) G21-G26.

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