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P.A Premkumar, S.A Starostin, H. de Vries, M. Creatore, P.M Koenraad, W.A MacDonald, M.CM van de SandenSurface Dynamics of SiO2-like Films on Polymers Grown by DBD Assisted CVD at Atmospheric Pressure, Plasma Processes Polym. 11-129 (2012) 1194–1207.
A.C Bronneberg, N. Cankoy, M.CM van de Sanden, M. CreatoreIon-induced effects on grain boundaries and a-Si:H tissue quality in microcrystalline silicon films, J. Vac. Sci. Technol. A 630 (2012) 061512.
H.T Beyene, J.W Weber, M.A Verheijen, M.CM van de Sanden, M. CreatoreReal time in situ spectroscopic ellipsometry of the growth and plasmonic properties of au nanoparticles on SiO2, Nano Res. 5 (2012) 513-520.
M.V Ponomarev, M.A Verheijen, W. Keuning, M.CM van de Sanden, M. CreatoreControlling the resistivity gradient in chemical vapor deposition-deposited aluminum-doped zinc oxide, J. Appl. Phys. 112 (2012) 04370.
K. Sharma, M.A Verheijen, M.CM van de Sanden, M. CreatoreIn situ crystallization kinetics studies of plasma-deposited, hydrogenated amorphous silicon layers, J. Appl. Phys. 111 (2012) 6.
A.C Bronneberg, M.CM van de Sanden, M. CreatoreRemote plasma deposition of microcrystalline silicon thin-films: Film structure and the role of atomic hydrogen, J. Non-Cryst. Solids 358 (2012) 379-386.
G. Aresta, J. Palmans, M.CM van de Sanden, M. CreatoreInitiated-chemical vapor deposition of organosilicon layers: Monomer adsorption, bulk growth, and process window definition, J. Vac. Sci. Technol. A 30 (2012) 11.