Publications

Export 4 results:
Author Title Type [ Year(Desc)]
Filters: Author is Schlatmann, R.  [Clear All Filters]
1993
R. Schlatmann, A. Keppel, Y. Xue, J. Verhoeven, M.J van der Wiel,  Enhanced Reflectivity of Soft-X-Ray Multilayer Mirrors by Reduction of Si Atomic Density, Applied Physics Letters 2463 (1993) 3297-3299.
E. Louis, F. Bijkerk, L. Shmaenok, H.J Voorma, M.J van der Wiel, R. Schlatmann, J. Verhoeven, E.WJM van der Drift, J. Romijn, B.AC Rousseeuw et al.,  Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes, Microelectronic Engineering 1-421 (1993) 67-70.
1994
R. Schlatmann, C. Lu, J. Verhoeven, E.J Puik, M.J van der Wiel,  Modification by Ar and Kr Ion-Bombardment of Mo/Si X-Ray Multilayers, Applied Surface Science 278 (1994) 147-157.
E. Louis, H.J Voorma, N.B Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Y.Y Platonov, G.E van Dorssen, H.A Padmore,  Enhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment, Microelectronic Engineering 1-423 (1994) 215-218.