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Y. Liu, S. Starostin, F. Peeters, M.CM van de Sanden, H. de VriesAtmospheric-pressure diffuse dielectric barrier discharges in Ar-O2 gas mixture using 200 kHz/13.56 MHz dual frequency excitation, J. Phys. D: Appl. Phys. 51 (2018) 114002.
A.S Meshkova, F.M Elam, S.A Starostin, M.CM van de Sanden, H.W de VriesThe role of carrier gas flow in roll-to-roll AP-PECVD synthesized silica moisture barrier films, Surf. Coat. Technol. 339 (2018) 20-26.
Y. Liu, F.JJ Peeters, S.A Starostin, M.CM van de Sanden, H.W de VriesImproving uniformity of atmospheric-pressure dielectric barrier discharges using dual frequency excitation, Plasma Sources Sci. Technol. 27 (2018) 01LT01.
A.S Meshkova, Y. Liu, F.M Elam, S.A Starostin, M.CM van de Sanden, H.W de VriesThe role of the gradient film properties in silica moisture barriers synthesized in a roll-to-roll atmospheric pressure plasma enhanced CVD reactor, Plasma Process. Polym. 15 (2018) 1700093.
F.JJ Peeters, R.F Rumphorst, M.CM van de SandenPlasma conductivity as a probe for ambient air admixture in an atmospheric pressure plasma jet, Plasma Chem. Plasma Process. 38 (2018) 63-74.
G.J van Rooij, H. Akse, W. Bongers, M.CM van de SandenPlasma for Electrification of Chemical Industry: a Case Study on CO2 Reduction, Plasma Phys. Control. Fusion 60 (2018) 014019.
R. Sinha, I. Tanyeli, R. Lavrijsen, M.CM van de Sanden, A. BieberleThe electrochemistry of iron oxide thin films nanostructured by high ion flux plasma exposure, Electrochim. Acta 258 (2017) 709-717.
F.M Elam, B.CAM van der Velden-Schuermans, S.A Starostin, M.CM van de Sanden, H.W de VriesControl of the intrinsic microstructure in AP-PECVD synthesised amorphous silica thin films, RSC Adv. 7 (2017) 52274-52282.
D.UB Aussems, S.A Khrapak, I. Dogan, M.CM van de Sanden, T.W MorganAn analytical force balance model for dust particles with size up to several Debye lengths, Phys. Plasmas 24 (2017) 113702.
B.LM Klarenaar, R. Engeln, D.CM van den Bekerom, M.CM van de Sanden, A.S Morillo, O. GuaitellaTime evolution of vibrational temperatures in a CO2 glow discharge measured with infrared absorption spectroscopy, Plasma Sources Sci. Technol. 26 (2017) 115008.
M. Aghaee, A. Perrotta, S.A Starostin, H.W de Vries, M.CM van de Sanden, W.MM Kessels, M. CreatoreOn the synergistic effect of inorganic/inorganic barrier layers: An ellipsometric porosimetry investigation, Plasma Processes Polym. 14 (2017) 1700012.
Y. Hajar, V. di Palma, V. Kyriakou, M.A Verheijen, E.A Baranova, P. Vernoux, W.MM Kessels, M. Creatore, M.CM van de Sanden, M.N TsampasAtomic layer deposition of highly dispersed Pt nanoparticles on a high surface area electrode backbone for electrochemical promotion of catalysis, Electrochem. Commun. 84 (2017) 40-44.
D. Aussems, K.M Bal, T.W Morgan, M.CM van de Sanden, E. NeytsAtomistic simulations of graphite etching at realistic time scales, Chem. Sci. 8 (2017) 7160-7168.
D.UB Aussems, K. Bystrov, I. Dogan, C. Arnas, M. Cabié, T. Neisius, M. Rasinski, E. Zoethout, P. Lipman, M.CM van de Sanden et al.Fast nanostructured carbon microparticle synthesis by one-step high-flux plasma processing, Carbon 124 (2017) 403-414.
P. Diomede, M.CM van de Sanden, S. LongoInsight into CO2 Dissociation in Plasmas from Numerical Solution of a Vibrational Diffusion Equation, J. Phys. Chem. C 121 (2017) 19568–19576.
OA PDF icon 2017_67133.pdf (1.86 MB)
G.G van Eden, V. Kvon, M.CM van de Sanden, T.W MorganOscillatory vapour shielding of liquid metal walls in nuclear fusion devices, Nat. Comm. 8 (2017) 192.
V. Kvon, R. Al, K. Bystrov, F.JJ Peeters, M.CM van de Sanden, T.W MorganTin re-deposition and erosion measured by cavity-ring-down-spectroscopy under a high flux plasma beam, Nucl. Fusion 57 (2017) 086040.
F.M Elam, S.A Starostin, A.S Meshkova, B.CAM van der Velden-Schuermans, J.B Bouwstra, M.CM van de Sanden, H.W de VriesAtmospheric pressure roll-to-roll plasma enhanced CVD of high quality silica-like bilayer encapsulation films, Plasma Process. Polym.  (2017) 1600143.
OA PDF icon 2017_65830.pdf (1.55 MB)
I Adamovich, SD Baalrud, A. Bogaerts, PJ Bruggeman, M Cappelli, V Colombo, U Czarnetzki, U Ebert, JG Eden, M.CM van de Sanden et al.The 2017 Plasma Roadmap: Low temperature plasma science and technology, J. Phys. D: Appl. Phys. 50 (2017) 323001.
F.JJ Peeters, J. Zheng, I.MP Aarts, A.CR Pipino, W.MM Kessels, M.CM van de SandenAtomic hydrogen induced defect kinetics in amorphous silicon, J. Vac. Sci. Technol. A 35 (2017) 05C307.
OA PDF icon 2017_66993.pdf (616.89 KB)