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F.M Elam, B.CAM van der Velden-Schuermans, S.A Starostin, M.CM van de Sanden, H.W de VriesControl of the intrinsic microstructure in AP-PECVD synthesised amorphous silica thin films, RSC Adv. 7 (2017) 52274-52282.
D.UB Aussems, S.A Khrapak, I. Dogan, M.CM van de Sanden, T.W MorganAn analytical force balance model for dust particles with size up to several Debye lengths, Phys. Plasmas 24 (2017) 113702.
B.LM Klarenaar, R. Engeln, D.CM van den Bekerom, M.CM van de Sanden, A.S Morillo, O. GuaitellaTime evolution of vibrational temperatures in a CO2 glow discharge measured with infrared absorption spectroscopy, Plasma Sources Sci. Technol. 26 (2017) 115008.
M. Aghaee, A. Perrotta, S.A Starostin, H.W de Vries, M.CM van de Sanden, W.MM Kessels, M. CreatoreOn the synergistic effect of inorganic/inorganic barrier layers: An ellipsometric porosimetry investigation, Plasma Processes Polym. 14 (2017) 1700012.
Y. Hajar, V. di Palma, V. Kyriakou, M.A Verheijen, E.A Baranova, P. Vernoux, W.MM Kessels, M. Creatore, M.CM van de Sanden, M.N TsampasAtomic layer deposition of highly dispersed Pt nanoparticles on a high surface area electrode backbone for electrochemical promotion of catalysis, Electrochem. Commun. 84 (2017) 40-44.
D. Aussems, K.M Bal, T.W Morgan, M.CM van de Sanden, E. NeytsAtomistic simulations of graphite etching at realistic time scales, Chem. Sci. 8 (2017) 7160-7168.
D.UB Aussems, K. Bystrov, I. Dogan, C. Arnas, M. Cabié, T. Neisius, M. Rasinski, E. Zoethout, P. Lipman, M.CM van de Sanden et al.Fast nanostructured carbon microparticle synthesis by one-step high-flux plasma processing, Carbon 124 (2017) 403-414.
P. Diomede, M.CM van de Sanden, S. LongoInsight into CO2 Dissociation in Plasmas from Numerical Solution of a Vibrational Diffusion Equation, J. Phys. Chem. C 121 (2017) 19568–19576.
G.G van Eden, V. Kvon, M.CM van de Sanden, T.W MorganOscillatory vapour shielding of liquid metal walls in nuclear fusion devices, Nat. Comm. 8 (2017) 192.
V. Kvon, R. Al, K. Bystrov, F.JJ Peeters, M.CM van de Sanden, T.W MorganTin re-deposition and erosion measured by cavity-ring-down-spectroscopy under a high flux plasma beam, Nucl. Fusion 57 (2017) 086040.
F.M Elam, S.A Starostin, A.S Meshkova, B.CAM van der Velden-Schuermans, J.B Bouwstra, M.CM van de Sanden, H.W de VriesAtmospheric pressure roll-to-roll plasma enhanced CVD of high quality silica-like bilayer encapsulation films, Plasma Process. Polym.  (2017) 1600143.
I Adamovich, SD Baalrud, A. Bogaerts, PJ Bruggeman, M Cappelli, V Colombo, U Czarnetzki, U Ebert, JG Eden, M.CM van de Sanden et al.The 2017 Plasma Roadmap: Low temperature plasma science and technology, J. Phys. D: Appl. Phys. 50 (2017) 323001.
F.JJ Peeters, J. Zheng, I.MP Aarts, A.CR Pipino, W.MM Kessels, M.CM van de SandenAtomic hydrogen induced defect kinetics in amorphous silicon, J. Vac. Sci. Technol. A 35 (2017) 05C307.
den N. Harder, D.CM van den Bekerom, R.S Al, M.F Graswinckel, J.M Palomares, F.JJ Peeters, S. Ponduri, T. Minea, W.A Bongers, M.CM van de Sanden et al.Homogeneous CO2 conversion by microwave plasma: Wave propagation and diagnostics, Plasma Process. Polym. 14 (2017) e1600120.
T. Nozaki, A. Bogaerts, X. Tu, M.CM van de SandenSpecial issue: Plasma Conversion, Plasma Process. Polym. 14 (2017) 1790061.
Y. Liu, S. Welzel, S.A Starostin, M.CM van de Sanden, R. Engeln, H.W de VriesInfrared gas phase study on plasma-polymer interactions in high-current diffuse dielectric barrier discharge, J. Appl. Phys. 121 (2017) 243301.
F.M Elam, S.A Starostin, A.S Meshkova, B.CAM van der Velden, M.CM van de Sanden, H.W de VriesDefect prevention in silica thin films synthesized using AP-PECVD for flexible electronic encapsulation, J. Phys. D: Appl. Phys. 50 (2017) 25LT01.
A. Bieberle, I. Tanyeli, R. Lavrijsen, B. Koopmans, R. Sinha, M.CM van de SandenNanostructuring of iron thin films by high flux low energy helium plasma, Thin Solid Films 631 (2017) 50-56.