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Journal Article
C. Zhao, X. Lu, P. He, P. Zhang, W. Sun, J. Zhang, F. Chen, F. GouCF3+ etching silicon surface: A molecular dynamics study, Vacuum 86 (2012) 913-916.
F. Imbeaux, J. Citrin, J. Hobirk, G.MD Hogeweij, F. Kochl, V.M Leonov, S. Miyamoto, Y. Nakamura, V. Parail, G. Pereverzev et al.Current ramps in tokamaks: from present experiments to ITER scenarios, Nucl. Fusion 851 (2011) 083026.
OA PDF icon 2011_63149.pdf (1.93 MB)
C. Xia, P.F Chen, R. Keppens, A.J van MarleFormation of solar filaments by steady and nonsteady chromospheric heating, Astrophys. J. 1737 (2011) 27.
H.J van Eerten, Z. Meliani, R Wijers, R. KeppensJet simulations and gamma-ray burst afterglow jet breaks, Mon. Not. Roy. Astron. Soc. 3410 (2011) 2016-2024.
E.D de Rooij, U. von Toussaint, A.W Kleyn, W.J GoedheerMolecular dynamics simulations of amorphous hydrogenated carbon under high hydrogen fluxes, Phys. Chem. Chem. Phys. 4211 (2009) 9823-9830.
G. Giruzzi, M. Lennholm, A. Parkin, G. Aiello, M. Bellinger, J. Bird, F. Bouquey, H. Braune, A. Bruschi, P. Butcher et al.Objectives, physics requirements and conceptual design of an ECRH system for JET, Nucl. Fusion 651 (2011) 063033.
B. Lloyd, R.J Akers, F. Alladio, S. Allan, L.C Appel, M. Barnes, N.C Barratt, N. Ben Ayed, B.N Breizman, M. Cecconello et al.Overview of physics results from MAST, Nucl. Fusion 951 (2011) 094013.
G.MD Hogeweij, J.D. CallenPaleoclassical transport explains electron transport barriers in RTP and TEXTOR, Plasma Phys. Control. Fusion 650 (2008) 17.
W.EN van Harskamp, C.M Brouwer, D.C. Schram, M.CM van de Sanden, R. EngelnPopulation inversion in a magnetized hydrogen plasma expansion as a consequence of the molecular mutual neutralization process, Phys. Rev. E 83 (2011) 036412.
J. Steill, J.F Zhao, C.K Siu, Y.Y Ke, U.H Verkerk, J. Oomens, R.C Dunbar, A.C Hopkinson, K.WM SiuStructure of the Observable Histidine Radical Cation in the Gas Phase: A Captodative alpha-Radical Ion, Angew. Chem.-Int. Edit. 5047 (2008) 9666-9668.
H.B Profijt, M.CM van de Sanden, W.MM KesseleSubstrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth, J. Vac. Sci. Technol. A 31 (2013) 9.