Publications

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2020
I. Krebs, F.J Artola, C.R Sovinec, S.C Jardin, K.J Bunkers, M. Hoelzl, N.M Ferraro,  Axisymmetric simulations of vertical displacement events in tokamaks: A benchmark of M3D-C1, NIMROD and JOREK, Phys. Plasmas 27 (2020) 022505.
OA 
2019
M.C Sorkun, A. Khetan, S. Er,  AqSolDB, a curated reference set of aqueous solubility and 2D descriptors for a diverse set of compounds, Nat. Sci. Data 6 (2019) 143.
OA 
Y. Hayashi, N. Ohno, H.J van der Meiden, J. Scholten, S. Kajita, J. van den Berg, R. Perillo, J. Vernimmen, T. Morgan,  Application of Ion Sensitive Probe to High Density Plasmas in Magnum-PSI, Plasma Fusion Res. 14 (2019) 1202135.
OA 
Y. Liu, F.M Elam, E. Zoethout, S.A Starostin, M.CM van de Sanden, H.W de Vries,  Atmospheric-pressure silica-like thin film deposition using 200 kHz/13.56 MHz dual frequency excitation, J. Phys. D: Appl. Phys. 52 (2019) 355201.
OA PDF icon 2019_69489.pdf (786.67 KB)
A. Ho, J. Citrin, F. Auriemma, C. Bourdelle, F.J Casson, H.T Kim, P. Manas, G. Szepesi, H. Weisen, JET Contributors,  Application of Gaussian process regression to plasma turbulent transport model validation via integrated modelling, Nucl. Fusion 59 (2019) 056007.
OA PDF icon 2019_69422.pdf (1.25 MB)
D Di Carlo Rasi, R.AJ Janssen,  Advances in Solution-Processed Multijunction Organic Solar Cells, Adv. Mater. 31 (2019) 1806499.
OA 
V. di Palma, G. Zafeiropoulos, T. Goldsweer, W.MM Kessels, M.CM van de Sanden, M. Creatore, M.N Tsampas,  Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction, Electrochem. Commun. 98 (2019) 73-77.
OA 
2018
V. Kvon,  Alternative target concepts for power and particle exhaust in fusion application, PhD (2018) 
A.S Meshkova,  Atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) of silica: Understanding the role of the local deposition rate in the surface and film morphology, PhD (2018) 
S.S Denk, R. Fischer, H.M Smith, P. Helander, O. Maj, E. Poli, J. Stober, U. Stroth, W. Suttrop, E. Westerhof et al.,  Analysis of electron cyclotron emission with extended electron cyclotron forward modeling, Plasma Phys. Control. Fusion 60 (2018) 105010.
OA 
Y. Liu, S. Starostin, F. Peeters, M.CM van de Sanden, H. de Vries,  Atmospheric-pressure diffuse dielectric barrier discharges in Ar-O2 gas mixture using 200 kHz/13.56 MHz dual frequency excitation, J. Phys. D: Appl. Phys. 51 (2018) 114002.
OA 
G. Fuchsel, K. Cao, S. Er, E.WF Smeets, A.W Kleyn, L.BF Juurlink, G.J Kroes,  Anomalous Dependence of the Reactivity on the Presence of Steps: Dissociation of D-2 on Cu(211), J. Phys. Chem. Lett. 9 (2018) 170-175.
OA 
F.M Elam,  Atmospheric pressure-plasma enhanced chemical vapour deposition of silica. Characterisation and control of porosity in multi-layer encapsulation films, PhD (2018) 
2017
D Di Carlo Rasi, K.H Hendriks, M.M Wienk, R.AJ Janssen,  Accurate Characterization of Triple-Junction Polymer Solar Cells, Adv. Energy Mater. 7 (2017) 1701664.
OA 
D.UB Aussems, S.A Khrapak, I. Dogan, M.CM van de Sanden, T.W Morgan,  An analytical force balance model for dust particles with size up to several Debye lengths, Phys. Plasmas 24 (2017) 113702.
OA PDF icon 2017_67564.pdf (6.45 MB)
Y. Hajar, V. di Palma, V. Kyriakou, M.A Verheijen, E.A Baranova, P. Vernoux, W.MM Kessels, M. Creatore, M.CM van de Sanden, M.N Tsampas,  Atomic layer deposition of highly dispersed Pt nanoparticles on a high surface area electrode backbone for electrochemical promotion of catalysis, Electrochem. Commun. 84 (2017) 40-44.
OA PDF icon 2017_67501.pdf (426.08 KB)
D. Aussems, K.M Bal, T.W Morgan, M.CM van de Sanden, E. Neyts,  Atomistic simulations of graphite etching at realistic time scales, Chem. Sci. 8 (2017) 7160-7168.
OA 
F.JM Colberts, M.M Wienk, R.AJ Janssen,  Aqueous nanoparticle polymer solar cells: Effects of surfactant concentration and processing on device performance, ACS Appl. Mater. Interfaces 9 (2017) 13380-13389.
OA 
F.M Elam, S.A Starostin, A.S Meshkova, B.CAM van der Velden-Schuermans, J.B Bouwstra, M.CM van de Sanden, H.W de Vries,  Atmospheric pressure roll-to-roll plasma enhanced CVD of high quality silica-like bilayer encapsulation films, Plasma Process. Polym.  (2017) 1600143.
OA PDF icon 2017_65830.pdf (1.55 MB)
F.JJ Peeters, J. Zheng, I.MP Aarts, A.CR Pipino, W.MM Kessels, M.CM van de Sanden,  Atomic hydrogen induced defect kinetics in amorphous silicon, J. Vac. Sci. Technol. A 35 (2017) 05C307.
OA PDF icon 2017_66993.pdf (616.89 KB)

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