Publications

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2013
S.L Nyabero, R.WE van de Kruijs, A.E Yakshin, E. Zoethout, G. von Blanckenhagen, J. Bosgra, R.A Loch, F. BijkerkInterlayer growth in Mo/B4C multilayered structures upon thermal annealing, J. Appl. Phys. 113 (2013) 144310.
A.S Kuznetsov, M.A Gleeson, F. BijkerkHydrogen-induced blistering of Mo/Si multilayers: Uptake and distribution, Thin Solid Films 545 (2013) 571-579.
OA PDF icon 2013_54155.pdf (796.26 KB)
I.A Makhotkin, E. Zoethout, R. van de Kruijs, S.N Yakunin, E. Louis, A.M Yakunin, V. Banine, S. Mullender, F. BijkerkShort period La/B and LaN/B multilayer mirrors for similar to 6.8 nm wavelength, Opt. Express 2421 (2013) 29894-29904.
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V.V Medvedev, A.JR van den Boogaard, R. van der Meer, A.E Yakshin, E. Louis, V.M Krivtsun, F. BijkerkInfrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors, Opt. Express 1421 (2013) 16964-16974.
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R. van der Meer, I.V Kozhevnikov, H.MJ Bastiaens, K.J Boller, F. BijkerkExtended theory of soft x-ray reflection for realistic lamellar multilayer gratings, Opt. Express 1121 (2013) 13105-13117.
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R. Sobierajski, R.A Loch, R.WE van de Kruijs, E. Louis, G. von Blanckenhagen, E.M Gullikson, F. Siewert, A. Wawro, F. BijkerkMo/Si multilayer-coated amplitude-division beam splitters for XUV radiation sources, J. Synchrotron Rad. 20 (2013) 249-257.
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2012
J. Bosgra, J. Verhoeven, R.WE van de Kruijs, A.E Yakshin, F. BijkerkNon-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth, Thin Solid Films 522 (2012) 228–232.
M. Bayraktar, W. Wessels, C.J Lee, F. Van Goor, G. Koster, G. Rijnders, F. BijkerkActive multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths, J. Phys. D: Appl. Phys. 4945 (2012) 494001.
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A.JR van den Boogaard, E. Zoethout, I.A Makhotkin, E. Louis, F. BijkerkInfluence of noble gas ion polishing species on extreme ultraviolet mirrors, J. Appl. Phys. 12112 (2012) 123502.
I. Makhotkin, E. Zoethout, E. Louis, A.M Yakunin, S. Muellender, F. BijkerkWavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet, J. Micro-Nanolithogr. MEMS MOEMS 411 (2012) 040501.
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J. Bosgra, E. Zoethout, A.MJ van der Eerden, J. Verhoeven, R.WE van de Kruijs, A.E Yakshin, F. BijkerkStructural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors, Appl. Opt. 3651 (2012) 8541-8548.
V.V Medvedev, A.E Yakshin, R.WE van de Kruijs, V.M Krivtsun, A.M Yakunin, K.N Koshelev, F. BijkerkInfrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors, Opt. Lett. 37 (2012) 1169-1171.
A.S Kuznetsov, R. Stuik, F. Bijkerk, A.P ShevelkoSpectral and spatial structure of extreme ultraviolet radiation in laser plasma-wall interactions, Plasma Phys. Control. Fusion 54 (2012) 085019.
R.A Loch, R. Sobierajski, E. Louis, J. Bosgra, F. BijkerkModelling single shot damage thresholds of multilayer optics for high-intensity short-wavelength radiation sources, Opt. Express 2720 (2012) 28200–28215.
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A.S Kuznetsov, M.A Gleeson, F. BijkerkHydrogen-induced blistering mechanisms in thin film coatings, J. Phys. Condens. Matter 24 (2012) 052203.
OA PDF icon 2012_49078.pdf (1.41 MB)
A.JR van den Boogaard, F.A van Goor, E. Louis, F. BijkerkWavelength separation from extreme ultraviolet mirrors using phaseshift reflection, Opt. Lett. 237 (2012) 160-162.
F. Liu, C.J Lee, J.Q Chen, E. Louis, P.JM van der Slot, K.J Boller, F. BijkerkEllipsometry with randomly varying polarization states, Opt. Express 20 (2012) 870-878.
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S. Bruijn, R.WE van de Kruijs, A.E Yakshin, F. BijkerkIon assisted growth of B4C diffusion barrier layers in Mo/Si multilayered structures, J. Appl. Phys. 111 (2012) 064303.
I.A Makhotkin, E. Zoethout, E. Louis, A.M Yakunin, S. Mullender, F. BijkerkSpectral properties of La/B - based multilayer mirrors near the boron K absorption edge, Opt. Express 20 (2012) 11778-11786.
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S.L Nyabero, R.WE van de Kruijs, A.E Yakshin, E. Zoethout, F. BijkerkThermally induced interface chemistry in Mo/B4C/Si/B4C multilayered films, J. Appl. Phys. 112 (2012) 054317.

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