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Journal Article
M.L Grecea, M.A Gleeson, W. van Schaik, A.W Kleyn, F. BijkerkCo-adsorption of NH(3) and SO(2) on quartz(0001): Formation of a stabilized complex, Chem. Phys. Lett. 4-6511 (2011) 270-276.
S.N Yakunin, I.A Makhotkin, K.V Nikolaev, R.WE van de Kruijs, M.A Chuev, F. BijkerkCombined EUV reflectance and X-ray reflectivity data analysis of periodic multilayer structures, Opt. Express 22 (2014) 20076–20086.
A. Dolgov, D. Lopaev, T. Rachimova, A. Kovalev, A. Vasil'Eva, C.J Lee, V.M Krivtsun, O. Yakushev, F. BijkerkComparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas, J. Phys. D-Appl. Phys. 47 (2014) 065205.
R. Sobierajski, S. Bruijn, A.R Khorsand, E. Louis, R de Kruijs, T. Burian, J. Chalupsky, J. Cihelka, A. Gleeson, J. Grzonka et al.Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources, Opt. Express 119 (2011) 193-205.
A. Gao, E. Zoethout, J.M Sturm, C.J Lee, F. BijkerkDefect formation in single layer graphene under extreme ultraviolet irradiation, Appl. Surf. Sci. 317 (2014) 745-751.
H.J Voorma, F. BijkerkDesign of an Extended Image Field Soft-X-Ray Projection System, Microelectronic Engineering 1-417 (1992) 145-148.
J.Q Chen, E. Louis, C.J Lee, H. Wormeester, R. Kunze, H. Schmidt, D. Schneider, R. Moors, W. van Schaik, M. Lubomska et al.Detection and characterization of carbon contamination on EUV multilayer mirrors, Opt. Express 1917 (2009) 16969-16979.
S. Abdali, L. Gerward, A.E Yakshin, E. Louis, F. BijkerkDetermination of crystallization as a function of Mo layer thickness in Mo/Si multilayers, Materials Research Bulletin 237 (2002) 279-289.
M.JH Kessels, F. Bijkerk, F.D Tichelaar, J. VerhoevenDetermination of in-depth density profiles of multilayer structures, Journal of Applied Physics 997 (2005) 
I.A Makhotkin, E. Louis, R.WE van de Kruijs, A.E Yakshin, E. Zoethout, A.Y Seregin, E.Y Tereschenko, S.N Yakunin, F. BijkerkDetermination of the density of ultrathin La films in La/B(4)C layered structures using X-ray standing waves, Phys. Status Solidi A-Appl. Mat. 11208 (2011) 2597-2600.
R. Stuik, L.A Shmaenok, H. Fledderus, S.S Andreev, E.A Shamov, S.Y Zuev, N.N Salashchenko, F. BijkerkDevelopment of low-energy x-ray fluorescence micro-distribution analysis using a laser plasma x-ray source and multilayer optics? Journal of Analytical Atomic Spectrometry 314 (1999) 387-390.
F. BijkerkDevelopment of multilayer coatings and spin-off to XRL applications, Journal De Physique Iv PR211 (2001) 509-510.
V Rooij-Lohmann, A.W Kleyn, F. Bijkerk, H.H Brongersma, A.E YakshinDiffusion and interaction studied nondestructively and in real-time with depth-resolved low energy ion spectroscopy, Appl. Phys. Lett. 694 (2009) 3.
F. Liu, C.J Lee, J.Q Chen, E. Louis, P.JM van der Slot, K.J Boller, F. BijkerkEllipsometry with randomly varying polarization states, Opt. Express 20 (2012) 870-878.
V de Rooij-Lohmann, A.E Yakshin, R.WE van de Kruijs, E. Zoethout, A.W Kleyn, E.G Keim, M. Gorgoi, F. Schafers, H.H Brongersma, F. BijkerkEnhanced diffusion upon amorphous-to-nanocrystalline phase transition in Mo/B4C/Si layered systems, J. Appl. Phys. 1108 (2010) 5.
R.A Loch, A. Levy, T. Ceccotti, F. Quere, C. Thaury, H. George, F. Bijkerk, K.J Boller, P. MartinEnhanced ion acceleration with extremely thin foils, Eur. Phys. J.-Spec. Top. 175 (2009) 133-138.
S.L Nyabero, R.WE van de Kruijs, A.E Yakshin, F. BijkerkEnhanced thermal stability of extreme ultraviolet multilayers by balancing diffusion-induced structural changes, Appl. Phys. Lett. 9103 (2013) 093105.
R. de Bruijn, K. Koshelev, F. BijkerkEnhancement of laser plasma EUV emission by shockwave-plasma interaction, Journal of Physics D-Applied Physics 1836 (2003) L88-L91.
R. de Bruijn, K.N Koshelev, S.V Zakharov, V.G Novikov, F. BijkerkEnhancement of laser plasma extreme ultraviolet emission by shockwave-laser interaction, Physics of Plasmas 412 (2005) 
E. Louis, H.J Voorma, N.B Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Y.Y Platonov, G.E van Dorssen, H.A PadmoreEnhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment, Microelectronic Engineering 1-423 (1994) 215-218.